Iwate
Japan
23
2024-05-23
The entities that hold a legal rights for patent applications filed by inventor SATO Jun:
Jun SATO from Iwate, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
DEPOSITION METHOD AND DEPOSITION APPARATUS
#2 | 2024-01-04MONITORING METHOD AND PLASMA PROCESSING APPARATUS
#3 | 2023-12-14PLASMA PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#4 | 2023-03-30DEPOSITION METHOD AND DEPOSITION APPARATUS
#5 | 2020-11-26Deposition method
#6 | 2020-11-26Deposition method
#7 | 2020-05-07Cleaning method and film deposition method
#8 | 2019-11-28Method for dry cleaning a susceptor and substrate processing apparatus
#9 | 2018-06-21Particle removal method and substrate processing method
#10 | 2018-05-17Film deposition apparatus and film deposition method
#11 | 2017-09-21Method for processing a substrate and substrate processing apparatus
#12 | 2017-09-07FILM DEPOSITION METHOD
#13 | 2017-08-03Film deposition method
#14 | 2017-05-04Substrate processing apparatus, substrate processing method and substrate holding member
#15 | 2016-12-29Method and apparatus for gap fill using deposition and etch processes
#16 | 2016-09-15Plasma processing device and operation method
#17 | 2016-09-01Method of depositing a silicon-containing film
#18 | 2016-03-10PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
#19 | 2016-03-03Substrate processing apparatus and method of processing a substrate
#20 | 2015-11-19Plasma processing method and plasma processing apparatus
#21 | 2015-08-20Plasma processing device and operation method
#22 | 2015-08-13Method for processing a substrate and substrate processing apparatus
#23 | 2015-05-07Substrate processing apparatus and substrate processing method
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