🔗 Permalink

Inventor profile of:

Taro IKEDA

City:

Nirasaki

Country:

Japan

Published Applications:

52

Last publication date:

2024-09-05

Top Assignees for applications by Taro IKEDA

The entities that hold a legal rights for patent applications filed by inventor IKEDA Taro:

TOKYO ELECTRON LIMITED 45 Tokyo, Japan
TOKYO ELECTRON LIMITED 5 Minato-ku, Japan
TOKYO ELECTRON LIMITED 3 Tokyo-To, Japan
Tokyo Electrcn Limited 1 Tokyo, Japan
Tokyo Electron Limited 1 Minato-ku, Tokyo, Japan
Tokyo Electron Limited 1 Minato-ku, Tokyo-To, Japan
TOKYO ELECTRON LIMIED 1 Tokyo, Japan
TOKYO ELECTRONICS LIMITED 1 Tokyo, Japan
TOHOKU UNIVERSITY 1 Miyagi, Japan

Recent patent applications by IKEDA Taro

Taro IKEDA from Nirasaki, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-09-05

US20240297020A1

PLASMA PROCESSING APPARATUS

#2 | 2024-05-23

US20240170260A1

PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD

#3 | 2024-02-01

US20240038500A1

Plasma processing apparatus

#4 | 2023-10-19

US20230335876A1

TUNER, AND IMPEDANCE MATCHING METHOD

#5 | 2023-09-21

US20230295797A1

Chemistry; metallurgy

FILM FORMING METHOD AND FILM FORMING APPARATUS

#6 | 2023-08-17

US20230260750A1

PLASMA PROCESSING APPARATUS

#7 | 2023-04-06

US20230106303A1

Plasma processing apparatus and plasma processing method

#8 | 2023-02-02

US20230031447A1

PLASMA PROCESSING APPARATUS

#9 | 2023-01-05

US20230005720A1

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#10 | 2022-03-17

US20220084797A1

Plasma processing apparatus

#11 | 2022-02-03

US20220037118A1

Plasma processing apparatus and plasma processing method

#12 | 2022-02-03

US20220037117A1

Shower plate, plasma processing apparatus and plasma processing method

#13 | 2021-12-02

US20210375588A1

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#14 | 2021-07-22

US20210225612A1

Array antenna and plasma processing apparatus

#15 | 2021-05-06

US20210134560A1

Plasma processing apparatus and plasma processing method

#16 | 2021-04-29

US20210125814A1

Control method and plasma processing apparatus

#17 | 2021-03-18

US20210082727A1

Plasma processing apparatus

#18 | 2021-03-11

US20210074517A1

Plasma processing apparatus and control method

#19 | 2021-03-11

US20210074516A1

Plasma probe device, plasma processing apparatus, and control method

#20 | 2021-02-11

US20210043426A1

Shower plate, lower dielectric member and plasma processing apparatus

#21 | 2021-02-04

US20210035788A1

Plasma processing apparatus and control method

#22 | 2021-02-04

US20210035787A1

Plasma processing apparatus and control method

#23 | 2020-12-03

US20200381224A1

Plasma density monitor, plasma processing apparatus, and plasma processing method

#24 | 2020-09-17

US20200294842A1

Plasma processing apparatus

#25 | 2017-09-14

US20170263417A1

Plasma processing apparatus and plasma processing method

#26 | 2016-12-08

US20160358757A1

Microwave plasma source and plasma processing apparatus

#27 | 2016-12-08

US20160358750A1

Power combiner and microwave introduction mechanism

#28 | 2016-09-29

US20160284516A1

Microwave plasma source and plasma processing apparatus

#29 | 2016-08-04

US20160222516A1

Chemistry; metallurgy

Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate

#30 | 2016-06-23

US20160177448A1

Chemistry; metallurgy

Plasma processing apparatus with shower plate having protrusion for suppressing film formation in gas holes of shower plate

#31 | 2015-07-30

US20150212127A1

Acquisition method for S-parameters in microwave introduction modules, and malfunction detection method

#32 | 2015-06-18

US20150170881A1

Microwave plasma source and plasma processing apparatus

#33 | 2015-05-14

US20150129586A1

MICROWAVE HEATING APPARATUS AND PROCESSING METHOD

#34 | 2014-09-25

US20140283747A1

Chemistry; metallurgy

Plasma processing apparatus and shower plate

#35 | 2014-06-12

US20140158302A1

Microwave radiation antenna, microwave plasma source and plasma processing apparatus

#36 | 2012-11-29

US20120299671A1

Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion

#37 | 2012-10-04

US20120247675A1

Plasma processing apparatus and plasma generation antenna

#38 | 2012-09-06

US20120222816A1

Surface wave plasma generating antenna and surface wave plasma processing apparatus

#39 | 2012-03-22

US20120067523A1

Tuner and microwave plasma source

#40 | 2010-07-01

US20100167540A1

Chemistry; metallurgy

Film forming method, plasma film forming apparatus and storage medium

#41 | 2010-01-21

US20100015799A1

Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, computer program and storage medium

#42 | 2009-12-31

US20090321936A1

Semiconductor device manufacturing method using valve metal and nitride of valve metal

#43 | 2009-09-10

US20090227104A1

Chemistry; metallurgy

Film deposition method and film deposition apparatus of metal film

#44 | 2009-08-25

US10635651

Plasma processing system and plasma processing method

#45 | 2009-07-16

US20090181538A1

Chemistry; metallurgy

Film forming method, film forming apparatus and storage medium

#46 | 2009-04-07

US10484430

Plasma processing apparatus and substrate mounting table employed therein

#47 | 2008-02-14

US20080038919A1

Plasma sputtering film deposition method and equipment

#48 | 2007-06-14

US20070134907A1

Substrate processing method and fabrication process of a semiconductor device

#49 | 2006-10-17

US10489423

Method of plasma treatment

#50 | 2006-06-20

US10617819

CVD process capable of reducing incubation time

#51 | 2006-01-12

US20060005930A1

Substrate supporting structure for semiconductor processing, and plasma processing device

#52 | 2005-12-08

US20050272247A1

Substrate processing method and fabrication process of a semiconductor device

InventorID:

1156875 ⎘