Tokyo
Japan
72
2025-12-18
The entities that hold a legal rights for patent applications filed by inventor MARUYAMA Ken:
Ken MARUYAMA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#2 | 2025-12-11RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#3 | 2025-08-14RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND
#4 | 2025-07-24RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER
#5 | 2025-07-24RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#6 | 2025-07-10RESIST PATTERN FORMATION METHOD
#7 | 2025-05-15Radiation-Sensitive Composition and Method for Forming Resist Pattern
#8 | 2025-05-08RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#9 | 2024-12-12PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
#10 | 2024-11-21RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#11 | 2024-11-14RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER
#12 | 2024-11-07RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#13 | 2024-10-03RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#14 | 2024-05-09RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
#15 | 2024-05-09RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#16 | 2024-04-18RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#17 | 2024-01-25METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#18 | 2024-01-18METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#19 | 2024-01-04RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#20 | 2023-12-14RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#21 | 2023-10-26RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#22 | 2023-08-31RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#23 | 2023-08-17COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
#24 | 2023-08-03Radiation-sensitive resin composition, method of forming resist pattern, and compound
#25 | 2023-07-27RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#26 | 2023-06-29RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
#27 | 2023-06-29COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
#28 | 2023-01-26Method for producing film
#29 | 2022-12-01RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#30 | 2022-10-20RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
#31 | 2022-09-22RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN
#32 | 2022-08-25RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER
#33 | 2022-08-11RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
#34 | 2022-02-10Radiation-sensitive resin composition, method for forming resist pattern and compound
#35 | 2021-12-16RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
#36 | 2021-10-14RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
#37 | 2021-08-26RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID
#38 | 2021-04-29Radiation-sensitive resin composition and resist pattern-forming method
#39 | 2020-12-31Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method
#40 | 2020-12-17RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
#41 | 2020-10-29Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid
#42 | 2020-10-22RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF
#43 | 2020-02-06Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
#44 | 2020-01-23RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
#45 | 2020-01-09RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER COMPOSITION
#46 | 2019-05-23PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
#47 | 2018-10-18Radiation-sensitive resin composition and method for forming resist pattern
#48 | 2018-09-20RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATION-SENSITIVE ACID GENERATING AGENT
#49 | 2017-06-08UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD
#50 | 2016-10-06Pattern-forming method and composition for resist pattern-refinement
#51 | 2016-04-21UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD
#52 | 2014-06-05Radiation-sensitive resin composition, and radiation-sensitive acid generating agent
#53 | 2013-11-07Radiation-sensitive resin composition, and radiation-sensitive acid generating agent
#54 | 2013-10-31Radiation-sensitive resin composition and compound
#55 | 2013-10-24Radiation-sensitive composition, and compound
#56 | 2013-10-03Radiation-sensitive resin composition and radiation-sensitive acid generating agent
#57 | 2013-07-18Radiation-sensitive resin composition
#58 | 2013-06-13Radiation-sensitive composition and compound
#59 | 2013-03-07Method for forming resist pattern and composition for forming protective film
#60 | 2013-02-28Polymer
#61 | 2012-11-22Radiation-sensitive resin composition
#62 | 2012-10-11Radiation-sensitive resin composition, compound and producing method of compound
#63 | 2012-09-20Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition
#64 | 2012-07-12Polymer, radiation-sensitive composition, monomer, and method of producing compound
#65 | 2012-06-28Radiation-sensitive composition and compound
#66 | 2012-03-08Radiation-sensitive resin composition and polymer
#67 | 2012-02-23Radiation-sensitive resin composition and compound
#68 | 2012-01-26Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method
#69 | 2011-05-19Compound and radiation-sensitive composition
#70 | 2010-12-30Radiation-sensitive composition, polymer and monomer
#71 | 2010-12-09Polymer, radiation-sensitive composition, monomer, and method of producing compound
#72 | 2009-11-05Compound and radiation-sensitive composition
116644 ⎘