JSR Corporation
Tokyo
Japan
1,190
2026-06-18
755
2026-02-24
Top Inventors for applications by JSR Corporation
These are the the leading inventors for applications assigned to JSR Corporation:
- Ken MARUYAMA 71 Tokyo, Japan
- Tomoki NAGAI 58 Tokyo, Japan
- Takehiko Naruoka 47 Tokyo, Japan
- Katsuaki NISHIKORI 43 Tokyo, Japan
- Hirokazu SAKAKIBARA 39 Tokyo, Japan
- Yukio NISHIMURA 38 Tokyo, Japan
- Hiromitsu NAKASHIMA 37 Tokyo, Japan
- Hiroyuki KOMATSU 34 Tokyo, Japan
- Ryuichi NEMOTO 31 Tokyo, Japan
- Motohiro SHIRATANI 30 Tokyo, Japan
- Hisashi NAKAGAWA 30 Tokyo, Japan
- Shinya MINEGISHI 30 Tokyo, Japan
- Taiichi FURUKAWA 28 Tokyo, Japan
- Masafumi HORI 26 Tokyo, Japan
- Kazunori TAKANASHI 25 Tokyo, Japan
- Tatsuya SAKAI 23 Tokyo, Japan
- Hiroki Nakagawa 23 Tokyo, Japan
- Kazuki KASAHARA 23 Tokyo, Japan
- Hayato Namai 22 Tokyo, Japan
- Kazuya KIRIYAMA 22 Tokyo, Japan
- Kazunori SAKAI 21 Tokyo, Japan
- Takuhiro Taniguchi 21 Tokyo, Japan
- Yoshio TAKIMOTO 21 Tokyo, Japan
- Shin-ya NAKAFUJI 21 Tokyo, Japan
- JSR CORPORATION 20 Tokyo, Japan
- Yusuke ANNO 20 Tokyo, Japan
- Gouji WAKAMATSU 20 Tokyo, Japan
- Hitoshi Osaki 19 Tokyo, Japan
- Tsutomu Shimokawa 19 Tokyo, Japan
- Shin-ya MINEGISHI 18 Tokyo, Japan
- Yuushi MATSUMURA 18 Tokyo, Japan
- Takashi MORI 17 Tokyo, Japan
- Yusuke ASANO 17 Tokyo, Japan
- Hajime INAMI 17 Tokyo, Japan
- Makoto SUGIURA 16 Tokyo, Japan
- Takuo Sone 16 Tokyo, Japan
- Atsushi Nakamura 16 Tokyo, Japan
- Ryuichi SERIZAWA 16 Tokyo, Japan
- Toru KIMURA 16 Tokyo, Japan
- Naoya Nosaka 15 Tokyo, Japan
- Satoshi Dei 15 Tokyo, Japan
- Natsuko KINOSHITA 15 Tokyo, Japan
- Hiromu MIYATA 15 Tokyo, Japan
- Kiyoshi Kimura 14 Saitama, Japan
- Kazuo NAKAHARA 14 Tokyo, Japan
- Goji WAKAMATSU 14 Tokyo, Japan
- Takanori Kawakami 14 Tokyo, Japan
- Eiji YONEDA 14 Tokyo, Japan
- Tsuyoshi FURUKAWA 13 Tokyo, Japan
- Yasuo Matsuki 13 Tokyo, Japan
- Tomoaki SEKO 13 Tokyo, Japan
- Satoru MURAKAMI 13 Tokyo, Japan
- Toshiaki Kadota 13 Tokyo, Japan
- Tsubasa ABE 13 Tokyo, Japan
- Toshihiro Tadaki 13 Tokyo, Japan
- Daisuke SHIMIZU 12 Tokyo, Japan
- Hiromitsu TANAKA 12 Tokyo, Japan
- Masayuki MIYAKE 12 Tokyo, Japan
- Katsumi INOMATA 12 Tokyo, Japan
- Kazunori KUSABIRAKI 12 Tokyo, Japan
- Takayoshi Abe 12 Tokyo, Japan
- Nobuji Matsumura 12 Tokyo, Japan
- Noboru Otsuka 12 Tokyo, Japan
- Ryouji Tanaka 12 Tokyo, Japan
- Kazuo INOUE 12 Tokyo, Japan
- Mitsuo SATO 12 Tokyo, Japan
- Noboru Oshima 12 Tokyo, Japan
- Kiyoshi TANAKA 12 Tokyo, Japan
- Motoyuki SHIMA 12 Tokyo, Japan
- Takashi Okada 11 Tokyo, Japan
- Atsushi Shiota 11 Sunnyvale, CA United States
- Kensuke MIYAO 11 Tokyo, Japan
- Miki TAMADA 11 Tokyo, Japan
- Kyoyu Yasuda 11 Tokyo, Japan
- Hiroki NAKATSU 11 Tokyo, Japan
- JSR CORPORATION 11 , United States
- Yasuhiko MATSUDA 11 Tokyo, Japan
- Kiyoshi Kimura 11 Hidaka, Japan
- Nobuo Kawahashi 11 Chuo-ku, Japan
- Tomohiro UTAKA 10 Tokyo, Japan
- Hiroyuki Ishii 10 Tokyo, Japan
- Tomohiro Oda 10 Tokyo, Japan
- Takashi TSUBOUCHI 10 Tokyo, Japan
- Masahiro AKIYAMA 10 Tsukuba-Shi, Japan
- Tomohiro KAKIZAWA 10 Tokyo, Japan
- Nagayuki KANAOKA 10 Wako, Japan
- Masayuki MOTONARI 10 Tokyo, Japan
- Terukazu KOKUBO 10 Tokyo, Japan
- Koji Ito 10 Tokyo, Japan
- Isao NISHIMURA 10 Tokyo, Japan
- Hirofumi GOTO 10 Tokyo, Japan
- Takuma Ebata 10 Tokyo, Japan
- Nobuo Kawahashi 10 Tokyo, Japan
- Norihiko SUGIE 10 Tokyo, Japan
- Takeo SHIOYA 10 Tokyo, Japan
- Toshiyuki KAI 10 Tokyo, Japan
- Makoto Shimizu 10 Tokyo, Japan
- Tatsuya Yamanaka 10 Mie, Japan
- Daisuke Yamada 9 Saitama, Japan
- Sosuke OSAWA 9 Tokyo, Japan
Recent patent applications by JSR Corporation
JSR Corporation based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
US20260169385A1
PhysicsMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION
#2 | 2026-06-18US20260167755A1
Chemistry; metallurgyRadiation-Sensitive Composition, Resist Pattern Formation Method, Acid-Generator, and Compound
#3 | 2026-06-11US20260165058A1
ElectricityMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#4 | 2026-05-21US20260140442A1
PhysicsRADIATION SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#5 | 2026-05-14US20260133493A1
PhysicsRADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND METHOD FOR PRODUCING THE POLYMER, AND COMPOUND
#6 | 2026-05-14US20260133488A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT
#7 | 2026-05-14US20260133485A1
PhysicsMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION
#8 | 2026-05-14US20260132221A1
Chemistry; metallurgyANTIBODY AND USE THEREOF
#9 | 2026-04-16US20260104642A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR
#10 | 2026-04-16US20260104639A1
PhysicsRADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
#11 | 2026-04-02US20260093180A1
PhysicsMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FILM FORMATION
#12 | 2026-03-26US20260085154A1
Chemistry; metallurgyPOLYMER, COMPOSITION, CURED PRODUCT, LAMINATED BODY, AND ELECTRONIC COMPONENT
#13 | 2026-03-19US20260079401A1
PhysicsCOMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#14 | 2026-03-19US20260079396A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
#15 | 2026-03-05US20260063994A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
#16 | 2026-02-26US20260056468A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
#17 | 2026-01-22US20260026281A1
ElectricityMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION
#18 | 2026-01-15US20260015577A1
Chemistry; metallurgyCOMPOSITION FOR 3D PRINTING SUPPORT OR 3D CELL CULTURE SUPPORT
#19 | 2026-01-01US20260003267A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT
#20 | 2025-12-18US20250383603A9
PhysicsRADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#21 | 2025-12-11US20250377590A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#22 | 2025-12-04US20250370340A1
PhysicsMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND POLYMER
#23 | 2025-11-27US20250362596A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR
#24 | 2025-11-13US20250346784A1
Chemistry; metallurgyCOMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD
#25 | 2025-11-13US20250346554A1
Chemistry; metallurgyMETHOD FOR PURIFYING COMPOSITION
#26 | 2025-10-30US20250334881A1
PhysicsRADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RADIATION SENSITIVE ACID GENERATOR, AND ACID DIFFUSION CONTROL AGENT
#27 | 2025-10-30US20250334880A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND
#28 | 2025-10-16US20250321484A1
PhysicsMETHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COMPOSITION
#29 | 2025-10-16US20250321483A1
PhysicsRADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#30 | 2025-09-11US20250281549A1
Human necessitiesPROPHYLACTIC OR THERAPEUTIC COMPOSITION FOR GRAFT-VERSUS-HOST DISEASE
#31 | 2025-08-28US20250271762A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#32 | 2025-08-28US20250271761A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#33 | 2025-08-28US20250271756A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID-GENERATING AGENT
#34 | 2025-08-14US20250258431A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND
#35 | 2025-08-07US20250251666A1
PhysicsRESIST UNDERLAYER FILM-FORMING COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#36 | 2025-07-24US20250237950A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER
#37 | 2025-07-24US20250237948A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#38 | 2025-07-10US20250224679A1
PhysicsRESIST PATTERN FORMATION METHOD
#39 | 2025-06-12US20250186469A1
Human necessitiesTHERAPEUTIC AGENT FOR OVARIAN CLEAR CELL CARCINOMA
#40 | 2025-05-29US20250170310A1
Human necessitiesMETHOD OF MANUFACTURING INTRAVASCULAR INDWELLING DEVICE, INTRAVASCULAR-INDWELLING-DEVICE MANUFACTURING HOLDER, AND METHOD OF EVALUATING INTRAVASCULAR INDWELLING DEVICE
#41 | 2025-05-22US20250164883A1
PhysicsRADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
#42 | 2025-05-22US20250164877A1
PhysicsRADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR
#43 | 2025-05-15US20250155802A1
PhysicsRadiation-Sensitive Composition and Method for Forming Resist Pattern
#44 | 2025-05-15US20250154398A1
Chemistry; metallurgyMETHOD FOR PRODUCING ABRASIVE GRAINS, COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, AND POLISHING METHOD
#45 | 2025-05-08US20250147421A1
PhysicsRADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
#46 | 2025-05-08US20250147418A1
PhysicsPHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE
#47 | 2025-04-17US20250122472A1
Chemistry; metallurgyMETHOD FOR PRODUCING GENE-MODIFIED T CELL POPULATION
#48 | 2025-04-17US20250122404A1
Chemistry; metallurgyPOLYMER, COMPOSITION, CURED PRODUCT, LAMINATED BODY, AND ELECTRONIC COMPONENT
#49 | 2025-04-17US20250122338A1
Chemistry; metallurgyPOLYMER
#50 | 2025-04-10US20250116935A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#51 | 2025-04-10US20250116922A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#52 | 2025-04-03US20250110407A1
PhysicsSEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM FORMING COMPOSITION
#53 | 2025-03-13US20250085629A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#54 | 2025-03-06US20250076762A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#55 | 2025-03-06US20250076761A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#56 | 2025-03-06US20250076760A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#57 | 2025-02-06US20250044701A1
PhysicsMETHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING COMPOSITION
#58 | 2025-01-30US20250032018A1
Human necessitiesENZYME SENSOR AND ENZYME SENSOR SYSTEM
#59 | 2025-01-09US20250013150A1
PhysicsRADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTO-DEGRADABLE BASE
#60 | 2025-01-02US20250004375A1
PhysicsRadiation-Sensitive Composition, Pattern Formation Method, and Photo-Degradable Base
#61 | 2024-12-12US20240411228A1
PhysicsPRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
#62 | 2024-12-05US20240402141A1
PhysicsMETHOD FOR FILLING COLUMN WITH CHROMATOGRAPHY CARRIER, METHOD FOR STORING SLURRY, AND SLURRY
#63 | 2024-11-28US20240393688A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#64 | 2024-11-28US20240393687A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#65 | 2024-11-28 ✅ Patent 12,560,841 granted on 2026-02-24US20240393644A1
PhysicsLIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR
#66 | 2024-11-21US20240389227A1
ElectricityRADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD
#67 | 2024-11-21US20240385520A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#68 | 2024-11-21US20240385518A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN FORMATION METHOD
#69 | 2024-11-14US20240377742A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER
#70 | 2024-11-07US20240369931A1
PhysicsMETHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING RESIST UNDERLAYER FILM, AND CLEANING LIQUID
#71 | 2024-11-07US20240369928A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
#72 | 2024-10-24US20240350943A1
Performing operations; transportingCHROMATOGRAPHIC BED INSERT
#73 | 2024-10-17US20240344032A1
Chemistry; metallurgyORGANOID PRODUCTION METHOD, CULTURE MEDIUM FOR ORGANOID PRODUCTION, ORGANOID, AND TEST SUBSTANCE EVALUATION METHOD
#74 | 2024-10-03US20240329523A1
PhysicsRADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#75 | 2024-10-03US20240325458A1
Human necessitiesCOMPOSITION FOR PRODUCING BILE ACIDS
#76 | 2024-09-26US20240319597A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND
#77 | 2024-09-26US20240319596A1
PhysicsRADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND
#78 | 2024-08-29US20240288773A1
PhysicsMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
#79 | 2024-08-22US20240279605A1
Chemistry; metallurgyCULTURE METHOD, CULTURE PRODUCT, SPHEROID, AND METHOD FOR SCREENING FOR TEST SUBSTANCE
#80 | 2024-08-22US20240279505A1
Chemistry; metallurgyCOMPOSITION, METAL-CONTAINING FILM, METAL-CONTAINING FILM FORMATION METHOD, AND COMPOSITION PRODUCTION METHOD
#81 | 2024-08-01US20240255852A1
PhysicsMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#82 | 2024-08-01US20240254365A1
Chemistry; metallurgyCHEMICAL MECHANICAL POLISHING COMPOSITION AND POLISHING METHOD
#83 | 2024-07-25US20240247215A1
Chemistry; metallurgyBIOMIMETIC SYSTEM AND METHOD FOR MANUFACTURING SAME
#84 | 2024-07-11US20240231231A1
PhysicsMETHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM
#85 | 2024-07-04US20240219832A1
PhysicsPHOTOSENSITIVE COMPOSITION
#86 | 2024-06-06US20240184203A1
PhysicsCOMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
#87 | 2024-06-06US20240183843A1
PhysicsMETHOD FOR EVALUATING EXCRETION OF SUBSTANCE OF INTEREST BY HUMAN HEPATOCYTE-LIKE CELL
#88 | 2024-05-09US20240153768A1
ElectricityMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#89 | 2024-05-09US20240152050A1
PhysicsRADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
#90 | 2024-05-09US20240152048A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#91 | 2024-05-09 ✅ Patent 12,570,933 granted on 2026-03-10US20240150680A1
Chemistry; metallurgyCOMPOSITION FOR SEMICONDUCTOR PROCESSING AND PROCESSING METHOD
#92 | 2024-05-09 ✅ Patent 12,570,929 granted on 2026-03-10US20240150677A1
Chemistry; metallurgyCOMPOSITION FOR SEMICONDUCTOR PROCESSING AND PROCESSING METHOD
#93 | 2024-05-02US20240142876A1
PhysicsSEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
#94 | 2024-04-18US20240126167A1
PhysicsRADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#95 | 2024-04-11US20240118612A1
PhysicsPHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIST PATTERN FILM, AND METHOD FOR MANUFACTURING PLATED SHAPED ARTICLE
#96 | 2024-03-28US20240105451A1
ElectricitySEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
#97 | 2024-03-21US20240094634A1
PhysicsRADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#98 | 2024-01-25US20240030030A1
ElectricityMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#99 | 2024-01-25US20240026069A1
Chemistry; metallurgyPOLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT
#100 | 2024-01-18US20240021429A1
ElectricityMETHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
Also check out JSR CORPORATION's (Tokyo, Japan) applicant profile with 354 patent applications submitted.
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