Eindhoven
Netherlands
26
2021-03-04
The entities that hold a legal rights for patent applications filed by inventor Menchtchikov Boris:
Boris Menchtchikov from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
Lithographic apparatus and device manufacturing method involving a heater
#2 | 2019-08-01Lithographic apparatus and device manufacturing method involving a heater
#3 | 2016-02-18Lithographic apparatus and device manufacturing method involving a heater
#4 | 2015-06-04Lithographic cluster system, method for calibrating a positioning device of a lithographic apparatus
#5 | 2012-05-10Lithographic apparatus and device manufacturing method involving a heater
#6 | 2011-09-08Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
#7 | 2011-09-08Lithographic apparatus and device manufacturing method
#8 | 2011-09-01Calibration of lithographic apparatus
#9 | 2011-08-25Lithographic apparatus and method controlling parameter drift by performing multiple patterning passes on reference substrate
#10 | 2011-08-25Calibration of lithographic apparatus by exposing patterns on substrate positioned at different orientations
#11 | 2011-08-25Lithographic apparatus and device manufacturing method for measuring wafer parameters using non-standard alignment settings
#12 | 2011-08-25Lithographic apparatus and device manufacturing method
#13 | 2011-08-25Method and apparatus for controlling a lithographic apparatus
#14 | 2010-12-23Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor
#15 | 2009-02-26Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device
#16 | 2009-02-26Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate
#17 | 2007-11-08Optimized correction of wafer thermal deformations in a lithographic process
#18 | 2007-04-26Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device
#19 | 2007-04-12Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate
#20 | 2007-03-15Method of calibrating a lithographic apparatus and device manufacturing method
#21 | 2007-03-08Lithographic method
#22 | 2006-06-08Calibration substrate and method for calibrating a lithographic apparatus
#23 | 2006-04-27Lithographic apparatus and device manufacturing method
#24 | 2006-02-16Lithographic apparatus and device manufacturing method having liquid evaporation control
#25 | 2006-02-16Lithographic apparatus and device manufacturing method
#26 | 2005-06-23Optimized correction of wafer thermal deformations in a lithographic process
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