Veldhoven
Netherlands
5,818
2026-06-04
4,841
2026-02-10
ASML Netherlands B.V. is a Dutch company based in Veldhoven, NL. It is a leading supplier of lithography systems for the semiconductor industry, and is the largest company in the Netherlands by market capitalization. ASML designs, develops, integrates, markets and services advanced technology systems, including lithography systems that are used by customers to pattern advanced semiconductor chips. The company also provides related services, including customer support and training, maintenance and field services.
These are the the leading inventors for applications assigned to ASML Netherlands B.V.:
ASML Netherlands B.V. based in Veldhoven, NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
SYSTEMS AND METHODS FOR PULSED VOLTAGE CONTRAST DETECTION AND CAPTURE OF CHARGING DYNAMICS
#2 | 2026-06-04ELECTRON-OPTICAL ELEMENT
#3 | 2026-06-04A FIBER MANUFACTURING INTERMEDIATE PRODUCT AND METHOD OF PRODUCING PHOTONIC CRYSTAL FIBERS
#4 | 2026-05-28CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
#5 | 2026-05-28POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS
#6 | 2026-05-21METHOD FOR IMPROVING CONSISTENCY IN MASK PATTERN GENERATION
#7 | 2026-05-21MULTISCALE PHYSICAL ETCH MODELING AND METHODS THEREOF
#8 | 2026-05-21OPTICAL SYSTEM FOR METROLOGY
#9 | 2026-05-14CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
#10 | 2026-05-14ALIGNMENT OF ELECTRON-OPTICAL ELEMENTS
#11 | 2026-05-14CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
#12 | 2026-05-14POSITIONING SYSTEM, LITHOGRAPHIC TOOL AND METHOD FOR POSITIONING A MOVEABLE OBJECT USING A POSITIONING SYSTEM
#13 | 2026-05-14MACHINE LEARNING BASED IMAGE GENERATION FOR MODEL BASE ALIGNMENTS
#14 | 2026-05-14SOURCE OPTIMIZATION FOR MITIGATING MASK ERROR IMPACT
#15 | 2026-05-14HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR
#16 | 2026-05-07ELECTRON-OPTICAL MODULE
#17 | 2026-05-07SIMULATION MODEL STABILITY DETERMINATION METHOD
#18 | 2026-04-30LITHOGRAPHIC APPARATUS STAGE COUPLING
#19 | 2026-04-30TUNABLE OPTICAL SYSTEM
#20 | 2026-04-30Method and Device for Machining a Wafer-Holding Device for a Wafer Lithography Process
#21 | 2026-04-23DEFECT MAP BASED D2D ALIGNMENT OF IMAGES FOR MACHINE LEARNING TRAINING DATA PREPARATION
#22 | 2026-04-23SIMULATION-ASSISTED METHODS AND SOFTWARE TO GUIDE SELECTION OF PATTERNS OR GAUGES FOR LITHOGRAPHIC PROCESSES
#23 | 2026-04-16METHOD OF TILT METROLOGY AND ASSOCIATED APPARATUSES
#24 | 2026-04-16RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS
#25 | 2026-04-16METHOD TO DETERMINE AN ABSOLUTE POSITION OF AN OBJECT, INTERFEROMETER SYSTEM, PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS
#26 | 2026-04-09PHOTO-ELECTRICAL EVOLUTION DEFECT INSPECTION
#27 | 2026-04-09CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
#28 | 2026-04-02ELECTROSTATIC CLAMP WITH A STRUCTURED ELECTRODE BY POST BOND STRUCTURING
#29 | 2026-04-02INSPECTION SYSTEMS USING METASURFACE AND INTEGRATED OPTICAL SYSTEMS FOR LITHOGRAPHY
#30 | 2026-04-02SYSTEMS AND METHODS FOR PREDICTING POST-ETCH STOCHASTIC VARIATION
#31 | 2026-04-02MIRROR LAYER AND MIRROR FOR A LITHOGRAPHIC APPARATUS
#32 | 2026-04-02PARTICLE TRANSFER APPARATUS AND METHODS
#33 | 2026-03-26LITHOGRAPHIC APPARATUS AND METHOD
#34 | 2026-03-26AN ILLUMINATION MODULE FOR A METROLOGY DEVICE
#35 | 2026-03-19SYSTEMS AND METHODS FOR FOCUSING CHARGED-PARTICLE BEAMS
#36 | 2026-03-19A PATTERNING DEVICE VOLTAGE BIASING SYSTEM FOR USE IN EUV LITHOGRAPHY
#37 | 2026-03-19METHOD AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC APPARATUS, AND A LITHOGRAPHIC APPARATUS
#38 | 2026-03-12METHOD FOR TRAINING OR USING A PROCESS MODEL FOR DETERMINING A PATTERN IN A PATTERNING PROCESS
#39 | 2026-03-12LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS FOR CONTROLLING OPTICAL ABERRATIONS, AND METHOD THEREOF
#40 | 2026-03-05OBJECT TABLE, STAGE APPARATUS, HOLDING METHOD AND LITHOGRAPHIC APPARATUS
#41 | 2026-03-05METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
#42 | 2026-02-26METHOD OF CONTROLLING A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD
#43 | 2026-02-26PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
#44 | 2026-02-10 ✅ Patent 12,546,731 granted on 2026-02-10Inspection tool, inspection tool operating method, and non-transitory computer readable medium
#45 | 2026-01-15APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
#46 | 2026-01-15DESIGN FOR MULTIPLE OFF-AXIS ILLUMINATION BEAMS FOR WAFER ALIGNMENT SENSOR
#47 | 2026-01-15CONTROL METHOD AND CONTROL SYSTEM FOR CONTROLLING A POSITION OF AN OBJECT WITH AN ELECTROMAGNETIC ACTUATOR
#48 | 2026-01-08METHOD, APPARATUS, AND SYSTEM FOR DYNAMICALLY CONTROLLING AN ELECTROSTATIC CHUCK DURING AN INSPECTION OF WAFER
#49 | 2026-01-01SYSTEMS AND METHODS OF ENERGY DISCRIMINATION OF BACKSCATTERED CHARGED-PARTICLES
#50 | 2026-01-01METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY
#51 | 2026-01-01CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR, DETECTOR ARRAY, AND METHODS
#52 | 2025-12-25SYSTEM AND METHOD FOR DETECTING PARTICLES WITH A DETECTOR DURING INSPECTION
#53 | 2025-12-25CALIBRATION OF DIGITAL ANALOG CONVERTER TO CONTROL DEFLECTORS IN CHARGED PARTICLE BEAM SYSTEM
#54 | 2025-12-25SYSTEM AND METHOD FOR IMAGE RESOLUTION CHARACTERIZATION
#55 | 2025-12-25SYSTEM AND METHOD FOR GENERATING PREDICTIVE IMAGES FOR WAFER INSPECTION USING MACHINE LEARNING
#56 | 2025-12-18CHARGED PARTICLE APPARATUS
#57 | 2025-12-18SCANNING ELECTRON MICROSCOPY (SEM) BACK-SCATTERING ELECTRON (BSE) FOCUSED TARGET AND METHOD
#58 | 2025-12-18CLASSIFYING PRODUCT UNITS
#59 | 2025-12-18FLUSHING SYSTEM AND METHOD FOR A LITHOGRAPHIC APPARATUS
#60 | 2025-12-18PROJECTION SYSTEM CONTROL
#61 | 2025-12-11METHOD AND APPARATUS FOR BONDING SUBSTRATES
#62 | 2025-12-11HIGH-THROUGHPUT LOAD LOCK CHAMBER
#63 | 2025-12-11PARAMETERIZED INSPECTION IMAGE SIMULATION
#64 | 2025-12-11HOLOGRAPHIC METROLOGY APPARATUS AND METHOD
#65 | 2025-12-11EUV RADIATION BEAM POWER REDUCTION
#66 | 2025-12-11ILLUMINATION ADJUSTMENT APPARATUSES AND LITHOGRAPHIC APPARATUSES
#67 | 2025-12-04METHOD FOR MONITORING PROPER FUNCTIONING OF ONE OR MORE COMPONENTS OF A LITHOGRAPHY SYSTEM
#68 | 2025-12-04TUNABLE OPTICAL SYSTEM
#69 | 2025-12-04CONTAMINATION CONTROL
#70 | 2025-12-04POSITIONING SYSTEM FOR AN OPTICAL ELEMENT OF A METROLOGY APPARATUS
#71 | 2025-12-04SENSOR MODULE, ILLUMINATOR, METROLOGY DEVICE AND ASSOCIATED METROLOGY METHOD
#72 | 2025-12-04FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
#73 | 2025-12-04METHOD FOR TRAINING MACHINE LEARNING MODEL TO DETERMINE OPTICAL PROXIMITY CORRECTION FOR MASK
#74 | 2025-12-04MACHINE LEARNING BASED SUBRESOLUTION ASSIST FEATURE PLACEMENT
#75 | 2025-12-04SYSTEMS FOR PATH COMPENSATION WITH A MOVING OBJECTIVE
#76 | 2025-12-04METHOD OF FORMING A PATTERNED LAYER OF MATERIAL, APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL
#77 | 2025-11-27METHOD FOR RULE-BASED RETARGETING OF TARGET PATTERN
#78 | 2025-11-27METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
#79 | 2025-11-27SYSTEMS AND METHODS OF DEFECT DETECTION BY VOLTAGE CONTRAST IMAGING
#80 | 2025-11-20ELECTRON-OPTICAL ASSEMBLY
#81 | 2025-11-20METHODS OF MITIGATING CROSSTALK IN METROLOGY IMAGES
#82 | 2025-11-20MODE CONTROL OF PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION SOURCES
#83 | 2025-11-20METHOD FOR CALIBRATING SIMULATION PROCESS BASED ON DEFECT-BASED PROCESS WINDOW
#84 | 2025-11-20INFERENCE MODEL TRAINING
#85 | 2025-11-20MODELLING OF MULTI-LEVEL ETCH PROCESSES
#86 | 2025-11-20OPTICAL ALIGNMENT SYSTEM AND METHOD
#87 | 2025-11-13FLUID DISPENSING SYSTEM AND METHOD
#88 | 2025-11-13CHARGED PARTICLE DEVICE, DETECTOR, AND METHODS
#89 | 2025-11-13PICTURE MODE RESOLUTION ENHANCEMENT FOR E-BEAM DETECTOR
#90 | 2025-11-13ISOLATING SPACER FOR ELECTRON-OPTICAL ASSEMBLY
#91 | 2025-11-13TRAINING A MACHINE LEARNING MODEL TO GENERATE MRC AND PROCESS AWARE MASK PATTERN
#92 | 2025-11-13METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
#93 | 2025-11-13SINGLE PAD OVERLAY MEASUREMENT
#94 | 2025-11-13ELECTROLYZER WITH DYNAMIC MEMBRANE
#95 | 2025-11-06DROPLET GENERATOR NOZZLE
#96 | 2025-11-06MECHATRONIC SYSTEM CONTROL METHOD, LITHOGRAPHIC APPARATUS CONTROL METHOD AND LITHOGRAPHIC APPARATUS
#97 | 2025-11-06A MEMBRANE AND ASSOCIATED METHOD AND APPARATUS
#98 | 2025-11-06CONFIGURABLE PRINTED OPTICAL ROUTING FOR PARALLEL OPTICAL DETECTION
#99 | 2025-11-06IDENTIFICATION OF HOT SPOTS OR DEFECTS BY MACHINE LEARNING
#100 | 2025-11-06SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
Also check out ASML NETHERLANDS B.V.'s (Veldhoven, Netherlands) applicant profile with 2,891 patent applications submitted.
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