Mt. View, California
United States
20
2022-12-29
The entities that hold a legal rights for patent applications filed by inventor Forster John C.:
John C. Forster from Mt. View, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Cleaning of SIN with CCP plasma or RPS clean
#2 | 2022-12-29Cleaning of sin with CCP plasma or RPS clean
#3 | 2022-01-27Methods and systems to modulate film stress
#4 | 2021-07-08Symmetric plasma source to generate pie-shaped treatment
#5 | 2021-06-03Plasma source for rotating susceptor
#6 | 2021-02-18Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool
#7 | 2020-12-17Shaped electrodes for improved plasma exposure from vertical plasma source
#8 | 2019-06-20Shaped electrodes for improved plasma exposure from vertical plasma source
#9 | 2019-06-20Geometrically selective deposition of dielectric films utilizing low frequency bias
#10 | 2018-11-15Plasma source for rotating susceptor
#11 | 2018-05-10Methods and systems to modulate film stress
#12 | 2017-07-27Symmetric plasma source to generate pie shaped treatment
#13 | 2017-05-25Lateral plasma/radical source
#14 | 2017-03-16Plasma Module With Slotted Ground Plate
#15 | 2016-09-22Elongated capacitively coupled plasma source for high temperature low pressure environments
#16 | 2016-01-28Plasma Source For Rotating Platen ALD Chambers
#17 | 2015-12-31Hole Pattern For Uniform Illumination Of Workpiece Below A Capacitively Coupled Plasma Source
#18 | 2015-06-04Apparatus and method for improved darkspace gap design in RF sputtering chamber
#19 | 2012-10-11Method for metal deposition using hydrogen plasma
#20 | 2011-12-29PRE-CLEAN CHAMBER WITH REDUCED ION CURRENT
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