Eran AMIT

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

Method and System for Providing a Quality Metric for Improved Process Control

Device-like metrology targets

Machine Learning in Metrology Measurements

Single Cell Grey Scatterometry Overlay Targets and Their Measurement Using Varying Illumination Parameter(s)

Overlay measurement using multiple wavelengths

Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)

Polarization measurements of metrology targets and corresponding target designs

DEVICE-LIKE METROLOGY TARGETS

Overlay measurement using phase and amplitude modeling

System for combined imaging and scatterometry metrology

Scatterometry overlay based on reflection peak locations

Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals

Enhancing metrology target information content

Recipe optimization based zonal analysis

Machine learning in metrology measurements

Quick adjustment of metrology measurement parameters according to process variation

Device metrology targets and methods

Target location in semiconductor manufacturing

Lithography systems with integrated metrology tools having enhanced functionalities

Metrology targets with supplementary structures in an intermediate layer

Metrology target design for tilted device designs

Device metrology targets and methods

Metrology using overlay and yield critical patterns

Compound imaging metrology targets

Polarization measurements of metrology targets and corresponding target designs

Identifying registration errors of DSA lines

Removing process-variation-related inaccuracies from scatterometry measurements

On-product derivation and adjustment of exposure parameters in a directed self-assembly process

Estimating and eliminating inter-cell process variation inaccuracy

Method and apparatus for direct self assembly in target design and production

Metrology target for combined imaging and scatterometry metrology