KLA Corporation

CLEANROOM COMPATIBLE ROBOTIC END EFFECTOR EXCHANGE SYSTEM

HIGH CONTRAST IMAGING IN BONDED SAMPLE METROLOGY USING OBLIQUE ILLUMINATION

ROBUST AND ACCURATE OVERLAY TARGET DESIGN FOR CMP

CVD BORON UNIFORMITY OVERCOMING LOADING EFFECTS

SAMPLE INSPECTION WITH MULTIPLE MEASUREMENT MODES

AMPLITUDE ASYMMETRY MEASUREMENTS IN OVERLAY METROLOGY

Methods and systems for regularizing the optimization of application specific semiconductor measurement system parameter settings

SYSTEM AND METHOD FOR OVERLAY METROLOGY USING A PHASE MASK

In-Situ In-Band and Out-of-Band Spectral Measurement for EUV Tools

OPTICAL AND X-RAY METROLOGY METHODS FOR PATTERNED SEMICONDUCTOR STRUCTURES WITH RANDOMNESS

BACK-ILLUMINATED SENSOR AND METHOD OF MAKING SAME

SINGLE WAFER ORIENTATION TOOL-INDUCED SHIFT CLEANING

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

SAPPHIRE LAMP FOR LASER SUSTAINED PLASMA BROADBAND LIGHT SOURCE

METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV LITHOGRAPHY

METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV LITHOGRAPHY

METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV LITHOGRAPHY

AUTOMATIC METHOD TO FIND EXTENT OF REPEATING GEOMETRY IN AN INTEGRATED CIRCUIT LAYOUT

MULTI-COLUMN LARGE FIELD OF VIEW IMAGING PLATFORM

Forward Library Based Seeding For Efficient X-Ray Scatterometry Measurements

SPECTRAL ANGULAR METROLOGY

BIASING AND READOUT METHODS FOR HIGH-SPEED RESISTIVE GATE SENSOR

RECOMMENDER SYSTEMS AND METHODS FOR AUTONOMOUS MODE SELECTION IN INSPECTION AND OTHER TOOLS

ROBUST IMAGE-TO-DESIGN ALIGNMENT FOR DRAM

QUANTITATIVE LINEAR INDEPENDENT VECTOR BASED METHOD (QLIVBM) FOR IMAGE ALIGNMENT

RARE EVENT TRAINING DATA SETS FOR ROBUST TRAINING OF SEMICONDUCTOR YIELD RELATED COMPONENTS

DEEP LEARNING BASED MODE SELECTION FOR INSPECTION

LASER-SUSTAINED PLASMA GENERATION IN SUPERSONIC GAS JETS

METROLOGY IN THE PRESENCE OF CMOS UNDER ARRAY (CUA) STRUCTURES UTILIZING MACHINE LEARNING AND PHYSICAL MODELING

METROLOGY IN THE PRESENCE OF CMOS UNDER ARRAY (CUA) STRUCTURES UTILIZING AN EFFECTIVE MEDIUM MODEL WITH CLASSIFICATION OF CUA STRUCTURES

METROLOGY IN THE PRESENCE OF CMOS UNDER ARRAY (CUA) STRUCTURES UTILIZING AN EFFECTIVE MEDIUM MODEL WITH PHYSICAL MODELING

GRATING-OVER-GRATING OVERLAY MEASUREMENT WITH PARALLEL COLOR PER LAYER

Optics For Measurement Of Thick Films And High Aspect Ratio Structures

AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

Passivation of nonlinear optical crystals

METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE

WAFER SIGNATURE LOCAL MAXIMA VIA CLUSTERING FOR METROLOGY GUIDED INSPECTION

Methods And Systems For Measurement Of Semiconductor Structures With Multi-Pass Statistical Optimization

METHODS OF IMAGING PATH POLARIZATION CONTROL FOR DEFECT DETECTION SENSITIVITY ENHANCEMENT

ANGULAR AVERAGING CALIBRATION ON BARE WAFER METROLOGY TOOLS FOR ESFQR MATCHING IMPROVEMENT

ASYMMETRIC GAS BEARING BUSHING FOR THERMO-PUMP

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

Laser-sustained plasma light source with tapered window

OSCILLATING SECONDARY STAGE FOR FRAME-MODE OVERLAY METROLOGY

Scanning overlay metrology with high signal to noise ratio

RECTANGULAR CUBOID, NON-POLARIZING BEAM SPLITTER THAT AVOIDS INTERFERENCE FRINGES FROM SURFACE REFLECTIONS

HIGH-POWER COMPACT VUV LASER-SUSTAINED PLASMA LIGHT SOURCE

DETECTING DEFECTS IN ARRAY REGIONS ON SPECIMENS

GAS FLOW CONFIGURATIONS FOR SEMICONDUCTOR INSPECTIONS

INTERFACE-BASED DEFECT INSPECTION USING SECOND HARMONIC GENERATION

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETRY ARRANGEMENTS

SYSTEM AND METHOD FOR ESTIMATING MEASUREMENT UNCERTAINTY FOR CHARACTERIZATION SYSTEMS

EXTREME ULTRAVIOLET SOURCE TEMPERATURE MONITORING USING CONFOCAL SENSOR

SYSTEM AND METHOD FOR MULTI-BEAM ELECTRON MICROSCOPY USING A DETECTOR ARRAY

LIFTER ASSEMBLY WITH BELLOWS FOR OPTICAL INSPECTION SYSTEM

Device feature specific edge placement error (EPE)

SYSTEM AND METHOD FOR ENHANCING DEFECT DETECTION IN OPTICAL CHARACTERIZATION SYSTEMS USING A DIGITAL FILTER

Single grab overlay measurement of tall targets

Tilt-column multi-beam electron microscopy system and method

Methods And Systems For Measurement Of Semiconductor Structures Based On Derivative Measurement Signals

Overlay Estimation Based on Optical Inspection and Machine Learning

Image pre-processing for overlay metrology using decomposition techniques

Targets for diffraction-based overlay error metrology

DISTORTION REDUCTION IN A MULTI-BEAM IMAGING SYSTEM

Water cooled, air bearing based rotating anode x-ray illumination source

Calibration Of Parametric Measurement Models Based On In-Line Wafer Measurement Data

Method and system of image-forming multi-electron beams

System and method for determining post bonding overlay

Confocal Chromatic Metrology for EUV Source Condition Monitoring

Auto-focus sensor implementation for multi-column microscopes

NOISE DIAGNOSTICS FOR AN ELECTRON BEAM INSPECTION SYSTEM WITH SWATHING

Lithography mask repair by simulation of photoresist thickness evolution

DETECTING DEFECTS ON SPECIMENS

System and method for mitigating overlay distortion patterns caused by a wafer bonding tool

Scatterometry overlay metrology with orthogonal fine-pitch segmentation

3D PROFILOMETRY WITH A LINNIK INTERFEROMETER

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

System and method for determining target feature focus in image-based overlay metrology

Reference image grouping in overlay metrology

Image Modeling-Assisted Contour Extraction

Systems and methods for metrology with layer-specific illumination spectra

System and method for reducing sample noise using selective markers

Rotating target for extreme ultraviolet source with liquid metal

Enhancing performance of overlay metrology

Creating multiple electron beams with a photocathode film

Universal metrology model

Massive overlay metrology sampling with multiple measurement columns

SHOT NOISE REDUCTION USING FRAME AVERAGING