St. Brelade
Jersey
73
2024-05-02
The entities that hold a legal rights for patent applications filed by inventor Moffatt Stephen:
Stephen Moffatt from St. Brelade, JE has applied for patents for these inventions. The list has both pending applications and granted patents:
LOW TEMPERATURE MEASUREMENT OF SEMICONDUCTOR SUBSTRATES
#2 | 2023-06-08SCANNING RADICAL SENSOR USABLE FOR MODEL TRAINING
#3 | 2023-05-18Semiconductor processing tools with improved performance by use of hybrid learning models
#4 | 2022-05-26Supplemental energy for low temperature processes
#5 | 2022-04-21Enhanced process and hardware architecture to detect and correct realtime product substrates
#6 | 2022-03-17ANTIFRAGILE SYSTEMS FOR SEMICONDUCTOR PROCESSING EQUIPMENT USING MULTIPLE SPECIAL SENSORS AND ALGORITHMS
#7 | 2022-02-03Semiconductor processing tools with improved performance by use of hybrid learning models
#8 | 2021-11-25Stacked pixel structure formed using epitaxy
#9 | 2021-10-21Gas injector with baffle
#10 | 2021-07-22Pulse train annealing method and apparatus
#11 | 2020-12-24Plasma-enhanced anneal chamber for wafer outgassing
#12 | 2019-05-09Method of thermal processing structures formed on a substrate
#13 | 2019-04-11Gas injector with baffle
#14 | 2018-10-04APPARATUS AND METHOD TO MEASURE TEMPERATURE OF 3D SEMICONDUCTOR STRUCTURES VIA LASER DIFFRACTION
#15 | 2018-09-27Apparatus and methods for photo-excitation processes
#16 | 2018-05-24Photonic activation of reactants for sub-micron feature formation using depleted beams
#17 | 2017-12-21HDD PATTERN IMPLANT SYSTEM
#18 | 2017-11-30Visual feedback for process control in RTP chambers
#19 | 2017-10-26INTEGRATION OF LASER PROCESSING WITH DEPOSITION OF ELECTROCHEMICAL DEVICE LAYERS
#20 | 2017-09-21ORIENTED LASER ACTIVATED PROCESSING CHAMBER
#21 | 2017-05-25SEMICONDUCTOR PROCESSING METHOD AND SEMICONDUCTOR DEVICE
#22 | 2017-03-23Ambient laminar gas flow distribution in laser processing systems
#23 | 2017-03-16Pulse train annealing method and apparatus
#24 | 2017-02-09Process sheet resistance uniformity improvement using multiple melt laser exposures
#25 | 2016-10-06Methods for crystallizing a substrate using a plurality of laser pulses and freeze periods
#26 | 2016-09-01Apparatus and method for speckle reduction in laser processing equipment
#27 | 2016-06-02Crystallization processing for semiconductor applications
#28 | 2016-05-19Multiple beam combiner for laser processing apparatus
#29 | 2016-01-28Pulse train annealing method and apparatus
#30 | 2016-01-21SCANNED PULSE ANNEAL APPARATUS AND METHODS
#31 | 2016-01-14Broadband laser source for laser thermal processing and photonically activated processes
#32 | 2015-12-24Apparatus and methods for pulsed photo-excited deposition and etch
#33 | 2015-12-10Managing thermal budget in annealing of substrates
#34 | 2015-05-07Multiple beam combiner for laser processing apparatus
#35 | 2015-03-26Method and apparatus for direct formation of nanometer scaled features
#36 | 2015-02-26Apparatus and method of improving beam shaping and beam homogenization
#37 | 2015-02-12Photonic activation of reactants for sub-micron feature formation using depleted beams
#38 | 2015-02-12Visual feedback for process control in RTP chambers
#39 | 2015-01-15Crystallization processing for semiconductor applications
#40 | 2014-09-18Methods for photo-excitation of precursors in epitaxial processes using a rotary scanning unit
#41 | 2014-09-18Apparatus and methods for pulsed photo-excited deposition and etch
#42 | 2014-09-11Process sheet resistance uniformity improvement using multiple melt laser exposures
#43 | 2014-09-11Apparatus for speckle reduction, pulse stretching, and beam homogenization
#44 | 2014-07-31Managing thermal budget in annealing of substrates
#45 | 2014-07-10Apparatus and method for speckle reduction in laser processing equipment
#46 | 2014-06-12Pulse train annealing method and apparatus
#47 | 2014-06-05Crystallization processing for semiconductor applications
#48 | 2014-05-29THERMAL TREATMENT METHODS AND APPARATUS
#49 | 2014-05-22Thermal processing apparatus
#50 | 2014-03-13PULSE TRAIN ANNEALING METHOD AND APPARATUS
#51 | 2014-02-06Apparatus and methods for microwave processing of semiconductor substrates
#52 | 2014-01-09METHOD FOR PARTITIONING AND INCOHERENTLY SUMMING A COHERENT BEAM
#53 | 2013-12-26Aperture control of thermal processing radiation
#54 | 2013-11-14Magneto-thermal processing apparatus and methods
#55 | 2013-06-27Multiple beam combiner for laser processing apparatus
#56 | 2013-06-06Crystallization processing for semiconductor applications
#57 | 2013-06-06Method and apparatus for decorrelation of spatially and temporally coherent light
#58 | 2013-05-23BROADBAND LASER SOURCE FOR LASER THERMAL PROCESSING AND PHOTONICALLY ACTIVATED PROCESSES
#59 | 2013-05-16Apparatus and method to measure temperature of 3D semiconductor structures via laser diffraction
#60 | 2013-05-02Laser crystallization and polycrystal efficiency improvement for thin film solar
#61 | 2013-03-28Apparatus and method for speckle reduction in laser processing equipment
#62 | 2013-03-14Apparatus and methods to manufacture high density magnetic media
#63 | 2013-03-07Methods for crystallizing a substrate using energy pulses and freeze periods
#64 | 2012-12-27Thermal processing apparatus
#65 | 2012-12-27NOVEL THERMAL PROCESSING APPARATUS
#66 | 2012-12-13PULSE CIRCULATOR
#67 | 2012-08-23Ambient laminar gas flow distribution in laser processing systems
#68 | 2012-07-26DEFECT-FREE JUNCTION FORMATION USING OCTADECABORANE SELF-AMORPHIZING IMPLANTS
#69 | 2012-06-14Apparatus and method of improving beam shaping and beam homogenization
#70 | 2011-10-06Laser beam positioning system
#71 | 2011-06-02Crystallization processing for semiconductor applications
#72 | 2010-10-21LED substrate processing
#73 | 2010-10-21Fiber laser substrate processing
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