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Inventor profile of:

RALF HOFMANN

City:

Soquel, California

Country:

United States

Published Applications:

45

Last publication date:

2024-01-25

Top Assignees for applications by RALF HOFMANN

The entities that hold a legal rights for patent applications filed by inventor HOFMANN RALF:

Applied Materials, Inc. 36 Santa Clara, CA United States
APPLE INC. 1 Cupertino, CA United States

Recent patent applications by HOFMANN RALF

RALF HOFMANN from Soquel, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-01-25

US20240027654A1

GLASS LAMINATE WITH AN OUTER GRADIENT LAYER

#2 | 2020-05-07

US20200142292A1

Glass ceramic for ultraviolet lithography and method of manufacturing thereof

#3 | 2020-02-20

US20200058213A9

Extreme Ultraviolet Mask Blank Production System With Thin Absorber And Manufacturing System Therefor

#4 | 2019-05-02

US20190130731A1

Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor

#5 | 2018-06-07

US20180158677A1

GROWING GRAPHENE ON SUBSTRATES

#6 | 2018-04-26

US20180114711A1

Monitoring system for deposition and method of operation thereof

#7 | 2017-12-21

US20170365491A1

Methods for the continuous processing of substrates

#8 | 2017-06-15

US20170168383A1

Amorphous Layer Extreme Ultraviolet Lithography Blank, And Manufacturing And Lithography Systems Therefor

#9 | 2017-06-08

US20170160632A1

Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor

#10 | 2017-05-25

US20170148631A1

Growing graphene on substrates

#11 | 2017-05-11

US20170131637A1

Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof

#12 | 2017-05-11

US20170131627A1

Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor

#13 | 2017-04-27

US20170115555A1

Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor

#14 | 2016-12-29

US20160377972A1

Glass ceramic for ultraviolet lithography and method of manufacturing thereof

#15 | 2016-09-22

US20160274454A1

System and method for manufacturing planarized extreme ultraviolet lithography blank

#16 | 2016-07-14

US20160204451A1

Shadow mask alignment and management system

#17 | 2016-06-23

US20160181134A1

Monitoring system for deposition and method of operation thereof

#18 | 2016-01-14

US20160011502A1

Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof

#19 | 2016-01-14

US20160011500A1

Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor

#20 | 2016-01-14

US20160011499A1

Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor

#21 | 2016-01-14

US20160011345A1

Extreme ultraviolet reflective element with amorphous layers and method of manufacturing thereof

#22 | 2016-01-14

US20160011344A1

Extreme ultraviolet capping layer and method of manufacturing and lithography thereof

#23 | 2015-08-20

US20150235847A1

Growing graphene on substrates

#24 | 2014-09-18

US20140272684A1

EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANK MANUFACTURING SYSTEM AND METHOD OF OPERATION THEREFOR

#25 | 2014-09-18

US20140268083A1

Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor

#26 | 2014-09-18

US20140268081A1

Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor

#27 | 2014-09-18

US20140268080A1

Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor

#28 | 2014-03-13

US20140071581A1

Portable electrostatic chuck carrier for thin substrates

#29 | 2014-02-06

US20140038431A1

Apparatus and methods for microwave processing of semiconductor substrates

#30 | 2013-08-01

US20130196078A1

Chemistry; metallurgy

Multi-Chamber Substrate Processing System

#31 | 2013-08-01

US20130192761A1

Chemistry; metallurgy

Rotary Substrate Processing System

#32 | 2013-08-01

US20130192524A1

Continuous substrate processing system

#33 | 2013-03-07

US20130056347A1

Chemistry; metallurgy

Cooling ring for physical vapor deposition chamber target

#34 | 2012-06-21

US20120152727A1

Chemistry; metallurgy

Alkali Metal Deposition System

#35 | 2011-09-22

US20110226617A1

Chemistry; metallurgy

DIELECTRIC DEPOSITION USING A REMOTE PLASMA SOURCE

#36 | 2011-06-09

US20110131792A1

Shadow mask alignment and management system

#37 | 2010-12-16

US20100313951A1

Carbon nanotube-based solar cells

#38 | 2010-10-07

US20100255660A1

SULFURIZATION OR SELENIZATION IN MOLTEN (LIQUID) STATE FOR THE PHOTOVOLTAIC APPLICATIONS

#39 | 2009-09-24

US20090238998A1

COAXIAL MICROWAVE ASSISTED DEPOSITION AND ETCH SYSTEMS

#40 | 2008-06-12

US20080135914A1

NANOCRYSTAL FORMATION

#41 | 2007-10-18

US20070243452A1

RELIABLE FUEL CELL ELECTRODE DESIGN

#42 | 2006-08-03

US20060172536A1

Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece

#43 | 2006-08-03

US20060169578A1

Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas

#44 | 2006-08-03

US20060169576A1

Physical vapor deposition plasma reactor with VHF source power applied through the workpiece

#45 | 2006-05-04

US20060093730A1

Performing operations; transporting

Monitoring a flow distribution of an energized gas

InventorID:

122072 ⎘