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Inventor profile of:

Bryan C. Hendrix

City:

Danbury, Connecticut

Country:

United States

Published Applications:

115

Last publication date:

2026-05-07

Top Assignees for applications by Bryan C. Hendrix

The entities that hold a legal rights for patent applications filed by inventor Hendrix Bryan C.:

ENTEGRIS, INC. 40 Billerica, MA United States
ADVANCED TECHNOLOGY MATERIALS, INC. 38 Danbury, CT United States
INTEL CORPORATION 1 Santa Clara, CA United States
ATMI Korea Co., Ltd 1 Suwon, South Korea
Advanced Tehnology Materials, Inc. 1 Danbury, CT United States
Entegris, Inc. 1 Billlerica, MA United States

Recent patent applications by Hendrix Bryan C.

Bryan C. Hendrix from Danbury, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-07

US20260125801A1

Chemistry; metallurgy

COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE ARTICLES AND APPARATUS

#2 | 2026-04-16

US20260103796A1

Chemistry; metallurgy

MULTILAYER COATINGS FOR REDUCED SURFACE METALS ON OXIDE FILMS

#3 | 2026-04-09

US20260098336A1

Chemistry; metallurgy

METAL CARBIDE FILMS AND RELATED DEVICES AND RELATED METHODS

#4 | 2026-04-09

US20260097352A1

Performing operations; transporting

DEVICES AND SYSTEMS FOR ADVANCED PURIFICATION AND RELATED METHODS

#5 | 2026-02-05

US20260035262A1

Chemistry; metallurgy

METHODS FOR SYNTHESIZING AND/OR PURIFYING MOLYBDENUM COMPOUNDS AND RELATED COMPOSITIONS AND RELATED SYSTEMS

#6 | 2025-12-18

US20250382701A1

Chemistry; metallurgy

SYSTEMS FOR ON-SITE PURIFICATION AND RELATED METHODS

#7 | 2025-08-28

US20250271293A1

LEVEL SENSORS FOR PRECURSOR VESSELS AND RELATED SYSTEMS AND RELATED METHODS

#8 | 2025-07-17

US20250230543A1

Chemistry; metallurgy

SYSTEMS FOR DELIVERING PRECURSORS AND RELATED METHODS

#9 | 2025-07-10

US20250223705A1

Chemistry; metallurgy

METAL BODY HAVING MAGNESIUM FLUORIDE REGION FORMED THEREFROM

#10 | 2025-04-24

US20250129485A1

Chemistry; metallurgy

COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE ARTICLES AND APPARATUS

#11 | 2025-03-06

US20250079157A1

METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND RELATED SYSTEMS

#12 | 2025-03-06

US20250075314A1

Chemistry; metallurgy

FORMING FILMS WITH IMPROVED STEP COVERAGE

#13 | 2025-03-06

US20250074927A1

Chemistry; metallurgy

PRECURSORS FOR SELECTIVE DEPOSITION OF SILICON-CONTAINING FILMS

#14 | 2025-01-16

US20250019822A1

Chemistry; metallurgy

METAL GETTERS IN VAPORIZERS FOR IMPURITY REMOVAL

#15 | 2025-01-02

US20250003072A1

Chemistry; metallurgy

HIGH PURITY MOLYBDENUM-CONTAINING PRECURSORS AND RELATED SYSTEMS AND METHODS

#16 | 2024-12-12

US20240412981A1

SELECTIVE RUTHENIUM DEPOSITION AND RELATED SYSTEMS AND METHODS

#17 | 2024-05-02

US20240140819A1

Chemistry; metallurgy

OXHALIDE PRECURSORS

#18 | 2024-03-21

US20240096631A1

Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt

#19 | 2024-03-14

US20240084452A1

Chemistry; metallurgy

VAPORIZATION VESSEL AND METHOD

#20 | 2024-02-01

US20240035157A1

Chemistry; metallurgy

Methods for depositing tungsten or molybdenum films

#21 | 2024-01-04

US20240002081A1

Performing operations; transporting

VIBRATION FILL PROCESS FOR SOLID CHEMISTRIES

#22 | 2023-12-28

US20230416913A1

Chemistry; metallurgy

MODULES FOR DELIVERY SYSTEMS AND RELATED METHODS

#23 | 2023-11-16

US20230366085A1

Chemistry; metallurgy

TRAY ASSEMBLIES FOR PRECURSOR DELIVERY SYSTEMS AND RELATED METHODS

#24 | 2023-09-14

US20230287564A1

Chemistry; metallurgy

DEVICES AND METHOD FOR DELIVERING MOLYBDENUM VAPOR

#25 | 2023-09-07

US20230279545A1

Chemistry; metallurgy

PROCESS FOR PREPARING SILICON-RICH SILICON NITRIDE FILMS

#26 | 2023-04-27

US20230128330A1

Chemistry; metallurgy

VAPOR DEPOSITION OF MOLYBDENUM USING A BIS(ALKYL-ARENE) MOLYBDENUM PRECURSOR

#27 | 2023-04-13

US20230115177A1

Chemistry; metallurgy

COMPRESSIBLE TRAY FOR SOLID CHEMICAL VAPORIZING CHAMBER

#28 | 2023-02-09

US20230041086A1

Chemistry; metallurgy

Vapor deposition precursor compounds and process of use

#29 | 2022-11-17

US20220364225A1

Chemistry; metallurgy

Method for forming carbon rich silicon-containing films

#30 | 2022-11-10

US20220359192A1

SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINING FILMS

#31 | 2022-10-06

US20220316055A1

Chemistry; metallurgy

LOW TEMPERATURE DEPOSITION PROCESS

#32 | 2022-09-22

US20220298629A1

Chemistry; metallurgy

Chemical delivery system and method of operating the chemical delivery system

#33 | 2022-08-25

US20220267895A1

Chemistry; metallurgy

Chemical vapor deposition processes using ruthenium precursor and reducing gas

#34 | 2021-12-23

US20210395884A1

Chemistry; metallurgy

Silicon precursor compounds and method for forming silicon-containing films

#35 | 2021-12-23

US20210395882A1

Chemistry; metallurgy

Method for nucleation of conductive nitride films

#36 | 2021-12-16

US20210388008A1

Chemistry; metallurgy

Vapor deposition precursor compounds and process of use

#37 | 2021-12-02

US20210370259A1

Performing operations; transporting

GAS SUPPLY PACKAGES, ADSORBENTS, AND RELATED METHODS

#38 | 2021-09-30

US20210301400A1

Chemistry; metallurgy

Precursors and methods for preparing silicon-containing films

#39 | 2021-07-01

US20210198788A1

Chemistry; metallurgy

METAL BODY HAVING MAGNESIUM FLUORIDE REGION FORMED THEREFROM

#40 | 2021-05-20

US20210147977A1

Chemistry; metallurgy

DENSIFIED SOLID PREFORMS FOR SUBLIMATION

#41 | 2021-03-25

US20210090860A1

Plasma immersion methods for ion implantation

#42 | 2021-03-18

US20210082708A1

Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt

#43 | 2021-03-04

US20210062331A1

Chemistry; metallurgy

GROUP VI METAL DEPOSITION PROCESS

#44 | 2021-01-14

US20210009437A1

Chemistry; metallurgy

Oxyhalide precursors

#45 | 2020-12-03

US20200378011A1

Chemistry; metallurgy

Coatings for enhancement of properties and performance of substrate articles and apparatus

#46 | 2020-11-12

US20200354830A1

Chemistry; metallurgy

Method for forming carbon rich silicon-containing films

#47 | 2020-10-29

US20200340110A1

Chemistry; metallurgy

Vaporization vessel and method

#48 | 2020-08-20

US20200266048A1

Selective deposition of silicon nitride

#49 | 2020-07-02

US20200206717A1

Performing operations; transporting

ADSORBENTS AND FLUID SUPPLY PACKAGES AND APPARATUS COMPRISING SAME

#50 | 2020-06-25

US20200199743A1

Chemistry; metallurgy

Methods for depositing a tungsten or molybdenum layer in the presence of a reducing co-reactant

#51 | 2020-05-21

US20200157680A1

Chemistry; metallurgy

PEALD PROCESSES USING RUTHENIUM PRECURSOR

#52 | 2020-05-14

US20200149155A1

Chemistry; metallurgy

Chemical vapor deposition processes using ruthenium precursor and reducing gas

#53 | 2020-04-30

US20200131628A1

Chemistry; metallurgy

METHOD FOR FORMING MOLYBDENUM FILMS ON A SUBSTRATE

#54 | 2020-04-16

US20200115798A1

Chemistry; metallurgy

Methods for depositing tungsten or molybdenum films

#55 | 2019-07-25

US20190226086A1

Chemistry; metallurgy

Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor

#56 | 2019-06-20

US20190186003A1

Chemistry; metallurgy

AMPOULE VAPORIZER AND VESSEL

#57 | 2019-06-13

US20190177840A1

Chemistry; metallurgy

Chemical delivery system and method of operating the chemical delivery system

#58 | 2019-04-25

US20190120433A1

Mechanical engineering

Heat transfer to ampoule trays

#59 | 2019-04-04

US20190100842A1

Chemistry; metallurgy

Coatings for enhancement of properties and performance of substrate articles and apparatus

#60 | 2018-05-10

US20180130654A1

Precursors for silicon dioxide gap fill

#61 | 2018-02-15

US20180044800A1

Chemistry; metallurgy

COATINGS FOR ENHANCEMENT OF PROPERTIES AND PERFORMANCE OF SUBSTRATE ARTICLES AND APPARATUS

#62 | 2018-02-15

US20180044788A1

Chemistry; metallurgy

Alloys of Co to reduce stress

#63 | 2017-12-07

US20170352549A1

Vapor phase etching of hafnia and zirconia

#64 | 2017-11-30

US20170342557A1

Chemistry; metallurgy

Solid vaporizer

#65 | 2017-04-13

US20170103888A1

AMINE CATALYSTS FOR LOW TEMPERATURE ALD/CVD SiO2 DEPOSITION USING HEXACHLORODISILANE/H2O

#66 | 2017-02-09

US20170037511A1

Chemistry; metallurgy

Solid precursor-based delivery of fluid utilizing controlled solids morphology

#67 | 2016-08-04

US20160225615A1

PRECURSORS FOR SILICON DIOXIDE GAP FILL

#68 | 2015-12-17

US20150364537A1

ALD processes for low leakage current and low equivalent oxide thickness BiTaO films

#69 | 2015-11-05

US20150318108A1

In-situ oxidized NiO as electrode surface for high k MIM device

#70 | 2015-07-09

US20150191819A1

Chemistry; metallurgy

Source reagent-based delivery of fluid with high material flux for batch deposition

#71 | 2015-05-28

US20150147824A1

Silylene compositions and methods of use thereof

#72 | 2014-11-06

US20140329025A1

Chemistry; metallurgy

SOLID PRECURSOR-BASED DELIVERY OF FLUID UTILIZING CONTROLLED SOLIDS MORPHOLOGY

#73 | 2014-08-07

US20140220733A1

Antimony and germanium complexes useful for CVD/ALD of metal thin films

#74 | 2014-07-24

US20140206134A1

Low temperature deposition of phase change memory materials

#75 | 2014-05-15

US20140134823A1

HIGH-K PEROVSKITE MATERIALS AND METHODS OF MAKING AND USING THE SAME

#76 | 2013-01-31

US20130029456A1

Antimony and germanium complexes useful for CVD/ALD of metal thin films

#77 | 2013-01-03

US20130005078A1

Low temperature deposition of phase change memory materials

#78 | 2012-05-31

US20120135590A1

SILICON REMOVAL FROM SURFACES AND METHOD OF FORMING HIGH K METAL GATE STRUCTURES USING SAME

#79 | 2012-05-24

US20120127629A1

DOPED ZrO2 CAPACITOR MATERIALS AND STRUCTURES

#80 | 2011-10-27

US20110263100A1

Antimony and germanium complexes useful for CVD/ALD of metal thin films

#81 | 2011-08-11

US20110195188A1

Chemistry; metallurgy

Chemical vapor deposition of high conductivity, adherent thin films of ruthenium

#82 | 2011-07-28

US20110183528A1

Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride

#83 | 2011-06-09

US20110136343A1

Composition and method for low temperature deposition of silicon-containing films

#84 | 2010-12-16

US20100317150A1

Antimony and germanium complexes useful for CVD/ALD of metal thin films

#85 | 2010-12-16

US20100314590A1

Chemistry; metallurgy

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

#86 | 2010-11-11

US20100285663A1

Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride

#87 | 2010-11-04

US20100279011A1

Chemistry; metallurgy

NOVEL BISMUTH PRECURSORS FOR CVD/ALD OF THIN FILMS

#88 | 2010-10-28

US20100270508A1

ZIRCONIUM PRECURSORS USEFUL IN ATOMIC LAYER DEPOSITION OF ZIRCONIUM-CONTAINING FILMS

#89 | 2010-10-07

US20100255198A1

Chemistry; metallurgy

Solid precursor-based delivery of fluid utilizing controlled solids morphology

#90 | 2010-09-02

US20100221914A1

Composition and method for low temperature deposition of silicon-containing films

#91 | 2010-07-01

US20100164057A1

Precursors for silicon dioxide gap fill

#92 | 2010-05-06

US20100112211A1

Chemistry; metallurgy

ZIRCONIUM, HAFNIUM, TITANIUM, AND SILICON PRECURSORS FOR ALD/CVD

#93 | 2010-04-22

US20100095865A1

Chemistry; metallurgy

Precursor compositions for ALD/CVD of group II ruthenate thin films

#94 | 2010-03-18

US20100068894A1

Chemistry; metallurgy

Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films

#95 | 2009-12-10

US20090305458A1

Antimony and germanium complexes useful for CVD/ALD of metal thin films

#96 | 2009-11-12

US20090281344A1

Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride

#97 | 2009-08-20

US20090208637A1

Chemistry; metallurgy

COBALT PRECURSORS USEFUL FOR FORMING COBALT-CONTAINING FILMS ON SUBSTRATES

#98 | 2009-06-25

US20090162550A1

Chemistry; metallurgy

COPPER (I) AMIDINATES AND GUANIDINATES, MIXED LIGAND COPPER COMPLEXES, AND COMPOSITIONS FOR CHEMICAL VAPOR DEPOSITION, ATOMIC LAYER DEPOSITION, AND RAPID VAPOR DEPOSITION OF COPPER

#99 | 2009-05-14

US20090124039A1

Low temperature deposition of phase change memory materials

#100 | 2009-04-02

US20090084288A1

Composition and method for low temperature deposition of silicon-containing films

InventorID:

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