Yan Wang

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System with power jet modules and method thereof

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Processing system and method for producing a particulate material

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Adaptively controlled pre-distortion circuits for RF power amplifiers

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In-service monitoring and cancellation of passive intermodulation interferences

#17 | 2015-07-30

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Adaptively controlled digital pre-distortion in an RF power amplifier using an integrated signal analyzer with enhanced analog-to-digital conversion

#18 | 2014-11-20

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Crest factor reduction for brand-limited multi-carrier signals

#19 | 2014-04-22

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Self-adaptive power amplification

#20 | 2013-09-10

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Integrated signal analyzer for adaptive control of mixed-signal integrated circuits

#21 | 2013-01-03

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FORMATION OF III-V MATERIALS USING MOCVD WITH CHLORINE CLEANS OPERATIONS

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Integrated signal analyzer for adaptive control of mixed-signal integrated circuit

#24 | 2011-06-09

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LASER MODULES AND PROCESSES FOR THIN FILM SOLAR PANEL LASER SCRIBING

#25 | 2011-03-03

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METHOD AND APPARATUS FOR LOCAL POLISHING CONTROL

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Method and apparatus for local polishing control

#27 | 2010-10-21

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POLISHING PAD WITH PROJECTING PORTION

#28 | 2010-04-22

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Chemistry; metallurgy

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#29 | 2009-03-05

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ECMP POLISHING SEQUENCE TO IMPROVE PLANARITY AND DEFECT PERFORMANCE

#30 | 2008-11-13

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METHOD AND PAD DESIGN FOR THE REMOVAL OF BARRIER MATERIAL BY ELECTROCHEMICAL MECHANICAL PROCESSING

#31 | 2008-05-08

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Conductive Polishing Article for Electrochemical Mechanical Polishing

#32 | 2008-02-28

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#34 | 2008-02-21

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#36 | 2008-01-03

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#37 | 2007-12-27

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METHOD AND COMPOSITION FOR POLISHING A SUBSTRATE

#38 | 2007-10-18

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Planarization of substrates at a high polishing rate using electrochemical mechanical polishing

#39 | 2007-09-20

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Methods and apparatus for electroprocessing with recessed bias contact

#40 | 2007-06-19

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Method and composition for polishing a substrate

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Hydrogen bubble reduction on the cathode using double-cell designs

#42 | 2007-05-03

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Chemistry; metallurgy

Contact assembly cleaning in an electrochemical mechanical processing apparatus

#45 | 2007-03-22

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#46 | 2007-02-15

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#47 | 2007-01-09

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Method and composition for polishing a substrate

#49 | 2006-08-03

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#50 | 2006-07-27

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#52 | 2006-06-27

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Conductive polishing article for electrochemical mechanical polishing

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#54 | 2006-03-02

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Conductive polishing article for electrochemical mechanical polishing

#56 | 2006-01-24

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Conductive polishing article for electrochemical mechanical polishing

#57 | 2006-01-12

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Method and composition for polishing a substrate

#58 | 2005-12-27

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Conductive polishing article for electrochemical mechanical polishing

#59 | 2005-12-22

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Retaining ring with conductive portion

#60 | 2005-10-06

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Multi-layer polishing pad for low-pressure polishing

#61 | 2005-07-28

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Control circuit for IEEE 1394b optical transmission protocol

#62 | 2005-06-23

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Conductive polishing article for electrochemical mechanical polishing

#63 | 2005-05-31

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Electrolyte composition and treatment for electrolytic chemical mechanical polishing

#64 | 2005-03-24

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Endpoint compensation in electroprocessing

#65 | 2005-01-06

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