Gilroy, California
United States
48
2020-11-12
The entities that hold a legal rights for patent applications filed by inventor Cox Michael S.:
Michael S. Cox from Gilroy, US has applied for patents for these inventions. The list has both pending applications and granted patents:
HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS
#2 | 2020-09-17Sputtering target with backside cooling grooves
#3 | 2019-11-14Physical vapor deposition in-chamber electro-magnet
#4 | 2019-08-08Method and apparatus for gas abatement
#5 | 2019-03-28Smart chamber and smart chamber components
#6 | 2019-01-24Plasma abatement of compounds containing heavy atoms
#7 | 2018-11-29Sputtering target with backside cooling grooves
#8 | 2018-11-08Plasma abatement of compounds containing heavy atoms
#9 | 2018-02-08Gas cooled substrate support for stabilized high temperature deposition
#10 | 2018-01-18Locally heated multi-zone substrate support
#11 | 2018-01-18Sputtering target with backside cooling grooves
#12 | 2017-11-02Non-disappearing anode for use with dielectric deposition
#13 | 2017-10-19Apparatus for exhaust cooling
#14 | 2017-08-03PLASMA ABATEMENT OF COMPOUNDS CONTAINING HEAVY ATOMS
#15 | 2017-06-08Arcing detection apparatus for plasma processing
#16 | 2017-05-11Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
#17 | 2017-03-02Electrostatic carrier for thin substrate handling
#18 | 2017-03-02In-situ removable electrostatic chuck
#19 | 2017-02-02Locally heated multi-zone substrate support
#20 | 2017-02-02High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process
#21 | 2017-01-26Method and apparatus for gas abatement
#22 | 2016-12-29METHOD AND APPARATUS TO ABATE PYROPHORIC BYPRODUCTS FROM ION IMPLANT PROCESS
#23 | 2016-12-15Wafer carrier for smaller wafers and wafer pieces
#24 | 2016-12-08Transparent electrostatic carrier
#25 | 2016-05-12Abatement system having a plasma source
#26 | 2016-04-28Capacitively coupled plasma source for abating compounds produced in semiconductor processes
#27 | 2015-09-17Smart chamber and smart chamber components
#28 | 2015-09-10Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
#29 | 2015-09-10Hall effect enhanced capacitively coupled plasma source
#30 | 2015-09-10Plasma abatement of compounds containing heavy atoms
#31 | 2015-08-20Gas cooled substrate support for stabilized high temperature deposition
#32 | 2015-06-11Wafer carrier for smaller wafers and wafer pieces
#33 | 2015-02-19Encapsulated magnetron
#34 | 2015-02-19Sputtering target with backside cooling grooves
#35 | 2015-02-12Locally heated multi-zone substrate support
#36 | 2015-02-05Electrostatic carrier for thin substrate handling
#37 | 2015-02-05In-situ removable electrostatic chuck
#38 | 2015-01-22Electrostatic chuck for high temperature process applications
#39 | 2015-01-22End effector for transferring a substrate
#40 | 2014-05-08Apparatus For Spatial Atomic Layer Deposition With Recirculation And Methods Of Use
#41 | 2013-12-19HALL EFFECT PLASMA SOURCE
#42 | 2013-10-31Apparatus for treating an exhaust gas in a foreline
#43 | 2013-10-17STATIC DEPOSITION PROFILE MODULATION FOR LINEAR PLASMA SOURCE
#44 | 2013-07-04ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS
#45 | 2013-05-02METHOD FOR BALANCING GAS FLOW SUPPLYING MULTIPLE CVD REACTORS
#46 | 2013-03-07METHOD AND APPARATUS FOR GAS DISTRIBUTION AND PLASMA APPLICATION IN A LINEAR DEPOSITION CHAMBER
#47 | 2012-01-05Deposition apparatus and methods to reduce deposition asymmetry
#48 | 2011-10-06Apparatus for physical vapor deposition having centrally fed RF energy
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