Inventor profile of:

Jun Hirose

City:

Miyagi

Country:

Japan

Published Applications:

29

Last publication date:

2025-09-18

Top Assignees for applications by Jun Hirose

The entities that hold a legal rights for patent applications filed by inventor Hirose Jun:

Recent patent applications by Hirose Jun

Jun Hirose from Miyagi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-09-18
US20250293010A1
Electricity

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MAINTENANCE METHOD

#2 | 2025-07-17
US20250233008A1
Electricity

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

#3 | 2025-07-17
US20250232967A1
Electricity

PROCESSING SYSTEM AND PROCESSING METHOD

#4 | 2024-12-26
US20240429031A1
Electricity

ALUMINA CERAMIC MEMBER, METHOD FOR MANUFACTURING ALUMINA CERAMIC MEMBER, COMPONENT FOR SEMICONDUCTOR MANUFACTURING APPARATUS, AND SUBSTRATE PROCESSING APPARATUS

#5 | 2024-11-07
US20240371609A1
Electricity

PLASMA PROCESSING APPARATUS

#6 | 2024-10-10
US20240339306A1
Electricity

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MAINTENANCE METHOD

#7 | 2024-07-18
US20240242976A1
Electricity

GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS

#8 | 2024-03-21
US20240096608A1
Electricity

PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE

#9 | 2023-01-19
US20230020793A1
Electricity

Plasma processing apparatus and mounting table thereof

#10 | 2022-07-07
US20220216035A1
Electricity

VACUUM PROCESSING APPARATUS AND MAINTENANCE APPARATUS

#11 | 2022-04-28
US20220130651A1
Electricity

PROCESSING SYSTEM AND PROCESSING METHOD

#12 | 2022-04-21
US20220122818A1
Electricity

Substrate processing apparatus, substrate processing system, and maintenance method

#13 | 2021-12-30
US20210407768A1
Electricity

SUBSTRATE PROCESSING APPARATUS

#14 | 2021-11-04
US20210343559A1
Electricity

Processing system

#15 | 2021-08-19
US20210257197A1
Electricity

SUBSTRATE PROCESSING METHOD, GAS FLOW EVALUATION SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

#16 | 2021-01-07
US20210005427A1
Electricity

Plasma etching method and plasma processing device

#17 | 2020-12-24
US20200402764A1
Electricity

Maintenance device

#18 | 2020-11-19
US20200365380A1
Electricity

Substrate support and plasma processing apparatus

#19 | 2020-07-09
US20200219753A1
Electricity

Plasma processing apparatus and mounting table thereof

#20 | 2019-06-27
US20190198298A1
Electricity

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

#21 | 2019-02-28
US20190066985A1
Electricity

Assembly provided with coolant flow channel, method of controlling assembly provided with coolant flow channel, and substrate processing apparatus

#22 | 2019-02-28
US20190063987A1
Physics

Method of inspecting flow rate measuring system

#23 | 2018-12-06
US20180350569A1
Electricity

Plasma processing method

#24 | 2018-12-06
US20180350566A1
Electricity

Plasma processing apparatus and plasma control method

#25 | 2018-08-16
US20180233328A1
Electricity

Vacuum processing apparatus and maintenance apparatus

#26 | 2018-03-01
US20180061619A1
Electricity

Plasma processing apparatus

#27 | 2017-09-14
US20170261258A1
Mechanical engineering

Method of arranging treatment process

#28 | 2015-09-10
US20150255255A1
Electricity

Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method

#29 | 2012-03-15
US20120061351A1
Electricity

Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method

InventorID:

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