Markus Bender

City:

Dresden

Country:

Germany

Published Applications:

Last publication date:

2020-07-16

Top Assignees for applications by Markus Bender

The entities that hold a legal rights for patent applications filed by inventor Bender Markus:

Markus Bender from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Photomask assembly with reflective photomask and method of manufacturing a reflective photomask

Reflective photomask and reflection-type mask blank

Shape metrology for photomasks

Metrology Mark with Elements Arranged in a Matrix, Method of Manufacturing Same and Alignment Method

Non-Telecentric Lithography Apparatus and Method of Manufacturing Integrated Circuits

InventorID:

1315584 ⎘