Haruko ONO

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2015-10-08

Top Assignees for applications by Haruko ONO

The entities that hold a legal rights for patent applications filed by inventor ONO Haruko:

Haruko ONO from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

METHOD AND APPARATUS FOR CLEANING SUBSTRATE

Method and apparatus for cleaning substrate

Apparatus for and method of processing substrate

Substrate processing method

Substrate processing method and substrate processing apparatus

InventorID:

1316975 ⎘