Beverly, Massachusetts
United States
133
2026-05-07
The entities that hold a legal rights for patent applications filed by inventor Olson Joseph C.:
Joseph C. Olson from Beverly, US has applied for patents for these inventions. The list has both pending applications and granted patents:
FORMATION OF ANGLED GRATINGS
#2 | 2026-03-05Ion Beam-Induced Epitaxial Crystallization on an Integrated Processing Architecture
#3 | 2026-01-15Workpiece Processing System with Multiple Beam Angles
#4 | 2025-02-27IN-SITU ION BEAM ANGLE MEASUREMENT
#5 | 2024-10-10HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
#6 | 2024-10-10APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
#7 | 2024-09-05APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT ION SOURCE AND RADICAL SOURCE
#8 | 2024-05-09MULTIPROCESS SUBSTRATE TREATMENT FOR ENHANCED SUBSTRATE DOPING
#9 | 2024-03-21System And Methods Using An Inline Surface Engineering Source
#10 | 2023-10-19Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#11 | 2023-09-14Variable Rotation Rate Batch Implanter
#12 | 2023-08-17Modulation of rolling k vectors of angled gratings
#13 | 2023-08-10Forming variable depth structures with laser ablation
#14 | 2023-06-29Cyclotron having continuously variable energy output
#15 | 2023-06-15Spinning disk with electrostatic clamped platens for ion implantation
#16 | 2022-09-22FORMATION OF ANGLED GRATINGS
#17 | 2022-08-18CONTROLLING ETCH ANGLES BY SUBSTRATE ROTATION IN ANGLED ETCH TOOLS
#18 | 2022-07-28SHADOW MASK APPARATUS AND METHODS FOR VARIABLE ETCH DEPTHS
#19 | 2022-05-26Method of forming a plurality of gratings
#20 | 2022-05-05Electrodynamic mass analysis with RF biased ion source
#21 | 2022-04-21TECHNIQUES FOR VARIABLE DEPOSITION PROFILES
#22 | 2022-03-31DEVICES AND METHODS FOR VARIABLE ETCH DEPTHS
#23 | 2022-03-10Handling and processing double-sided devices on fragile substrates
#24 | 2022-02-17Apparatus and techniques for angled etching using multielectrode extraction source
#25 | 2021-12-16Apparatus and system including high angle extraction optics
#26 | 2021-11-11Methods for variable etch depths
#27 | 2021-10-28Controlling etch angles by substrate rotation in angled etch tools
#28 | 2021-10-07System and methods using an inline surface engineering source
#29 | 2021-09-30In situ angle measurement using channeling
#30 | 2021-08-19Shadow mask apparatus and methods for variable etch depths
#31 | 2021-08-12Etch improvement
#32 | 2021-06-03Apparatus and techniques for substrate processing using independent ion source and radical source
#33 | 2021-05-13Methods of producing slanted gratings with variable etch depths
#34 | 2021-01-28Modulation of rolling k vectors of angled gratings
#35 | 2021-01-07Optical component having variable depth gratings and method of formation
#36 | 2020-12-31BEAMLINE ARCHITECTURE WITH INTEGRATED PLASMA PROCESSING
#37 | 2020-11-03Methods of producing slanted gratings with variable etch depths
#38 | 2020-09-17Apparatus, system and techniques for mass analyzed ion beam
#39 | 2020-06-18Handling and processing double-sided devices on fragile substrates
#40 | 2020-06-18Modulation of ion beam angle
#41 | 2020-06-18Modulation of rolling K vectors of angled gratings
#42 | 2020-06-18Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#43 | 2020-06-18Ion beam source for optical device fabrication using a segmented ion source having one or more angled surfaces
#44 | 2020-06-18Method of forming a plurality of gratings
#45 | 2020-06-18Methods of optical device fabrication using an ion beam source
#46 | 2020-06-18Method of forming gratings
#47 | 2020-06-18Methods of forming devices on a substrate
#48 | 2020-06-18Methods for controlling etch depth by localized heating
#49 | 2020-06-11Gate all around device and method of formation using angled ions
#50 | 2020-06-11Apparatus and techniques for angled etching using multielectrode extraction source
#51 | 2020-05-21System and method for detecting etch depth of angled surface relief gratings
#52 | 2020-05-14System and method for forming surface relief gratings
#53 | 2020-05-07Formation of angled gratings
#54 | 2020-04-23Optical component having depth modulated angled gratings and method of formation
#55 | 2020-04-16Techniques for forming angled structures
#56 | 2020-03-31Gate all around device and method of formation using angled ions
#57 | 2019-12-26System and methods using an inline surface engineering source
#58 | 2019-08-22Optical component having variable depth gratings and method of formation
#59 | 2019-05-28Controlling etch angles by substrate rotation in angled etch tools
#60 | 2018-10-04Electrodynamic mass analysis
#61 | 2017-05-25Modifying bulk properties of a glass substrate
#62 | 2016-04-21Workpiece Processing Method And Apparatus
#63 | 2015-12-10Electric/magnetic field guided acid diffusion
#64 | 2015-09-24Ion beam uniformity control using ion beam blockers
#65 | 2015-05-07Plasma cathode charged particle lithography system
#66 | 2015-04-23Apparatus to control an ion beam
#67 | 2015-04-23Dual stage scanner for ion beam control
#68 | 2014-11-11Dual mode ion implanter
#69 | 2014-11-06Apparatus and techniques for controlling ion implantation uniformity
#70 | 2014-10-07Apparatus and techniques for controlling ion implantation uniformity
#71 | 2014-09-23Apparatus and techniques for controlling ion angular spread
#72 | 2014-02-13Inductively coupled plasma ion source with multiple antennas for wide ion beam
#73 | 2013-10-17Double ended electrode manipulator
#74 | 2013-09-12Apparatus and method for controllably implanting workpieces
#75 | 2013-05-30Method and system for controlling critical dimension and roughness in resist features
#76 | 2013-05-02High-throughput ion implanter
#77 | 2013-03-14Method and system for modifying resist openings using multiple angled ions
#78 | 2012-11-08Method and system for controlling critical dimension and roughness in resist features
#79 | 2012-10-04Apparatus and method for multiple slot ion implantation
#80 | 2012-04-12Platen control
#81 | 2012-04-05Method and system for modifying patterned photoresist using multi-step ion implantation
#82 | 2012-03-22Ion beam tuning
#83 | 2012-03-08UNIFORMITY CONTROL USING ION BEAM BLOCKERS
#84 | 2011-08-04Ion source
#85 | 2011-06-30Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter
#86 | 2011-05-26Apparatus and method for controllably implanting workpieces
#87 | 2011-04-28TECHNIQUES FOR MAKING HIGH VOLTAGE CONNECTIONS
#88 | 2010-05-13Mass analysis magnet for a ribbon beam
#89 | 2010-04-22TECHNIQUES FOR ATOMIC LAYER DEPOSITION
#90 | 2010-04-15METHOD OF DETERMINING ANGLE MISALIGNMENT IN BEAM LINE ION IMPLANTERS
#91 | 2010-01-28ENERGY CONTAMINATION MONITOR WITH NEUTRAL CURRENT DETECTION
#92 | 2009-08-20Apparatus for measuring beam characteristics and a method thereof
#93 | 2009-07-02High tilt implant angle performance using in-axis tilt
#94 | 2009-07-02RF electron source for ionizing gas clusters
#95 | 2009-03-26Techniques for making high voltage connections
#96 | 2009-03-19Techniques for controlling a charged particle beam
#97 | 2009-03-05TECHNIQUES FOR TERMINAL INSULATION IN AN ION IMPLANTER
#98 | 2008-07-17Techniques for providing ion source feed materials
#99 | 2008-06-26Techniques for providing a ribbon-shaped gas cluster ion beam
#100 | 2008-05-08Ion implantation device with a dual pumping mode and method thereof
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