AMIT CHATTERJEE

City:

Cupertino, California

Country:

United States

Published Applications:

Last publication date:

2015-07-16

Top Assignees for applications by AMIT CHATTERJEE

The entities that hold a legal rights for patent applications filed by inventor CHATTERJEE AMIT:

AMIT CHATTERJEE from Cupertino, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Flowable carbon film by FCVD hardware using remote plasma PECVD

ENABLING RADICAL-BASED DEPOSITION OF DIELECTRIC FILMS

Ultra-thin structure to protect copper and method of preparation

Low temperature silicon nitride films using remote plasma CVD technology

Low cost flowable dielectric films

PHOTORESIST FOR IMPROVED LITHOGRAPHIC CONTROL

Methods for depositing metal-polymer composite materials atop a substrate

Radiation patternable CVD film

InventorID:

140027 ⎘