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Inventor profile of:

Alok VERMA

City:

Eindhoven

Country:

Netherlands

Published Applications:

23

Last publication date:

2025-07-10

Top Assignees for applications by Alok VERMA

The entities that hold a legal rights for patent applications filed by inventor VERMA Alok:

ASML Netherlands B.V. 22 Veldhoven, Netherlands
ASMLNETHERLANDS B.V. 1 Veldhoven, Netherlands

Recent patent applications by VERMA Alok

Alok VERMA from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-07-10

US20250224685A1

METHOD FOR DETERMINING A MEASUREMENT RECIPE AND ASSOCIATED APPARATUSES

#2 | 2024-01-11

US20240014078A1

Method and apparatus to determine a patterning process parameter

#3 | 2024-01-04

US20240004309A1

A METHOD OF MONITORING A LITHOGRAPHIC PROCESS

#4 | 2021-12-09

US20210384086A1

Method and apparatus to determine a patterning process parameter

#5 | 2021-10-28

US20210335678A1

Method and apparatus to determine a patterning process parameter

#6 | 2021-02-04

US20210035871A1

Method and apparatus to determine a patterning process parameter

#7 | 2020-09-10

US20200284578A1

Substrate, metrology apparatus and associated methods for a lithographic process

#8 | 2020-06-11

US20200185281A1

Method and apparatus to determine a patterning process parameter

#9 | 2020-04-23

US20200126872A1

Method and apparatus to determine a patterning process parameter

#10 | 2020-04-23

US20200124983A1

Methods and apparatus for inspection of a structure and associated apparatuses

#11 | 2020-03-05

US20200073254A1

Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method

#12 | 2020-01-09

US20200013685A1

Method and apparatus to determine a patterning process parameter

#13 | 2019-11-21

US20190354024A1

Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method

#14 | 2019-08-15

US20190250094A1

Method and apparatus for measuring a parameter of interest using image plane detection techniques

#15 | 2019-02-28

US20190063911A1

Substrate, metrology apparatus and associated methods for a lithographic process

#16 | 2017-09-07

US20170256465A1

Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry

#17 | 2017-09-07

US20170255738A1

Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values

#18 | 2017-09-07

US20170255737A1

Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion

#19 | 2017-09-07

US20170255736A1

Method and apparatus to determine a patterning process parameter

#20 | 2017-09-07

US20170255112A1

Method and apparatus to determine a patterning process parameter

#21 | 2017-03-30

US20170090301A1

Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes

#22 | 2017-03-02

US20170059999A1

Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method

#23 | 2016-01-28

US20160026096A1

Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing method

InventorID:

1425269 ⎘