Eindhoven
Netherlands
9
2021-08-05
The entities that hold a legal rights for patent applications filed by inventor EVERTS Frank:
Frank EVERTS from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
Reducing speckle in an excimer light source
#2 | 2020-12-24Control system and method
#3 | 2020-10-08Online calibration for repetition rate dependent performance variables
#4 | 2019-10-24Reducing speckle in an excimer light source
#5 | 2018-09-06Lithographic apparatus and method
#6 | 2018-07-19Reducing speckle in an excimer light source
#7 | 2018-01-04Online calibration for repetition rate dependent performance variables
#8 | 2017-06-22Online calibration for repetition rate dependent performance variables
#9 | 2016-03-10Method of controlling a radiation source and lithographic apparatus comprising the radiation source
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