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Inventor profile of:

Wayne L. Johnson

City:

Phoenix, Arizona

Country:

United States

Published Applications:

22

Last publication date:

2017-09-21

Top Assignees for applications by Wayne L. Johnson

The entities that hold a legal rights for patent applications filed by inventor Johnson Wayne L.:

Recent patent applications by Johnson Wayne L.

Wayne L. Johnson from Phoenix, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-09-21
US20170266728A1
Performing operations; transporting

Systems and methods for depositing charged metal droplets onto a workpiece

 #2 | 2016-03-24
US20160083679A1
Chemistry; metallurgy

Photo-bioreactor system and method for production of bio-materials

 #3 | 2012-10-25
US20120270304A1
Chemistry; metallurgy

Photo-bioreactor system and method

 #4 | 2008-12-09
US10259845
-

Optical monitoring and control system and method for plasma reactors

 #5 | 2007-10-23
US10450154
-

Rapid thermal processing lamp and method for manufacturing the same

 #6 | 2007-06-26
US10398652
-

Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy

 #7 | 2007-01-23
US10076099
-

Pulsed plasma processing method and apparatus

 #8 | 2006-08-15
US10258606
-

Measuring plasma uniformity in-situ at wafer level

 #9 | 2006-07-11
US10399981
-

Method of and structure for controlling electrode temperature

 #10 | 2006-06-27
US10247561
-

Chuck transport method and system

 #11 | 2006-04-18
US10415731
-

Method of fabricating oxides with low defect densities

 #12 | 2006-03-28
US10418041
-

Optical monitoring and control system and method for plasma reactors

 #13 | 2006-03-28
US10229036
-

Electrically controlled plasma uniformity in a high density plasma source

 #14 | 2005-12-27
US10743264
-

Inter-stage plasma source

 #15 | 2005-11-01
US10359556
-

Method and apparatus for tuning a plasma reactor chamber

 #16 | 2005-09-27
US10630783
-

Method and apparatus for active temperature control of susceptors

 #17 | 2005-08-18
US20050178335A1
Electricity

Apparatus for active temperature control of susceptors

 #18 | 2005-07-05
US10291763
-

Method of adjusting the thickness of an electrode in a plasma processing system

 #19 | 2005-05-10
US10168544
-

Method of wafer band-edge measurement using transmission spectroscopy and a process for controlling the temperature uniformity of a wafer

 #20 | 2005-03-08
US10189425
-

Segmented electrode apparatus for plasma processing

 #21 | 2005-03-01
US10031570
-

Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma

 #22 | 2005-01-06
US20050001555A1
Electricity

Method and device for removing harmonics in semiconductor plasma processing systems
InventorID:

1481480 ⎘