Osaka
Japan
10
2023-03-23
The entities that hold a legal rights for patent applications filed by inventor IMADE MAMORU:
MAMORU IMADE from Osaka, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
NON-PLASMA ENHANCED DEPOSITION FOR RECESS ETCH MATCHING
#2 | 2019-03-21Manufacturing method of III-V compound crystal and manufacturing method of semiconductor device
#3 | 2018-04-05METHOD FOR PRODUCING GROUP III NITRIDE CRYSTAL, SEMICONDUCTOR APPARATUS, AND APPARATUS FOR PRODUCING GROUP III NITRIDE CRYSTAL
#4 | 2017-12-21Crystal growth apparatus and crystal production method
#5 | 2017-11-09Method for producing group III element nitride crystal, group III element nitride crystal, semiconductor device, method for producing semiconductor device, and group III element nitride crystal production device
#6 | 2017-03-16Process for producing group III nitride crystal and apparatus for producing group III nitride crystal
#7 | 2017-03-16Method for producing group-III nitride crystal, group-III nitride crystal, semiconductor device, and device for producing group-III nitride crystal
#8 | 2016-09-15Method for producing group III nitride crystal, group III nitride crystal, semiconductor device and apparatus for producing group III nitride crystal
#9 | 2016-03-31APPARATUS FOR PRODUCING GROUP III NITRIDE CRYSTAL, AND METHOD FOR PRODUCING THE SAME
#10 | 2016-03-31Method for producing group III nitride crystal
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