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Inventor profile of:

Tsubasa ABE

City:

Tokyo

Country:

Japan

Published Applications:

15

Last publication date:

2023-02-09

Top Assignees for applications by Tsubasa ABE

The entities that hold a legal rights for patent applications filed by inventor ABE Tsubasa:

JSR Corporation 13 Tokyo, Japan
JSR CORPORATION 2 MINATO-KU, Japan
NIPPON CHEMI-CON CORPORATION 1 Shinagawa-ku, Tokyo, Japan
NIPPON CHEMI-CON CORPORATION 1 Tokyo, Japan

Recent patent applications by ABE Tsubasa

Tsubasa ABE from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-02-09

US20230041656A1

Chemistry; metallurgy

COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD OF FORMING RESIST PATTERN

#2 | 2022-06-23

US20220197144A1

COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD OF PRODUCING PATTERNED SUBSTRATE, AND COMPOUND

#3 | 2021-09-16

US20210286267A1

COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD

#4 | 2020-01-09

US20200012193A1

Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method

#5 | 2019-08-08

US20190243247A1

Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound

#6 | 2019-03-28

US20190094695A1

Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound

#7 | 2018-12-06

US20180348633A1

Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate

#8 | 2018-04-26

US20180114698A2

COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND

#9 | 2018-02-15

US20180046081A1

Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrate

#10 | 2017-06-01

US20170154782A1

Composition for film formation, film, production method of patterned substrate, and compound

#11 | 2017-05-18

US20170137663A9

Chemistry; metallurgy

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE

#12 | 2017-04-11

US14757551

Composition for film formation, film, production method of patterned substrate, and compound

#13 | 2016-10-27

US20160314984A1

Method for film formation, and pattern-forming method

#14 | 2016-09-08

US20160257842A1

Chemistry; metallurgy

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE

#15 | 2013-06-06

US20130141850A1

Capacitor device and method for manufacturing same

InventorID:

1642425 ⎘