Poughkeepsie, New York
United States
11
2018-04-12
The entities that hold a legal rights for patent applications filed by inventor Bailey Todd C.:
Todd C. Bailey from Poughkeepsie, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Process-metrology reproducibility bands for lithographic photomasks
#2 | 2016-09-29Process-metrology reproducibility bands for lithographic photomasks
#3 | 2012-07-12System and method for semiconductor device fabrication using modeling
#4 | 2012-05-03Pattern recognition with edge correction for design based metrology
#5 | 2012-05-03Pattern recognition with edge correction for design based metrology
#6 | 2011-09-15Method of enhancing photoresist adhesion to rare earth oxides
#7 | 2009-01-01Mask forming and implanting methods using implant stopping layer
#8 | 2008-11-20MASK HAVING IMPLANT STOPPING LAYER
#9 | 2008-08-28Variable fill and cheese for mitigation of BEOL topography
#10 | 2007-11-29Mask forming and implanting methods using implant stopping layer and mask so formed
#11 | 2007-11-29BOTTOM ANTI-REFLECTIVE COATING
1665235 ⎘