Lee Chen

TRANSFORMER COUPLED PLASMA SOURCE DESIGN FOR THIN DIELECTRIC FILM DEPOSITION

Control of plasma formation by RF coupling structures

INCREASING PLASMA UNIFORMITY IN A RECEPTACLE

PHOTOELECTRON ASSISTED PLASMA IGNITION

PROCESSING TOOL CAPABLE FOR FORMING CARBON LAYERS ON SUBSTRATES

SUBSTRATE PROCESSING TOOL CAPABLE OF MODULATING ONE OR MORE PLASMA TEMPORALLY AND/OR SPATIALLY

Compact high density plasma source

RF antenna producing a uniform near-field Poynting vector

RF antenna producing a uniform near-field Poynting vector

Self-sustained non-ambipolar direct current (DC) plasma at low power

Microwave plasma device

Non-ambipolar plasma enhanced DC/VHF phasor

Mono-energetic neutral beam activated chemical processing system and method of using

Plasma generation and control using a DC ring

Dipole ring magnet assisted microwave radial line slot antenna plasma processing method and apparatus

PNEUMATIC COUNTERBALANCE FOR ELECTRODE GAP CONTROL

Energetic negative ion impact ionization plasma

Non-ambipolar electric pressure plasma uniformity control

Low electron temperature, edge-density enhanced, surface-wave plasma (SWP) processing method and apparatus

Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma

Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma

Electric pressure systems for control of plasma properties and uniformity

Neutral beam etching of Cu-containing layers in an organic compound gas environment

Anisotropic etch of copper using passivation

Integrated induction coil and microwave antenna as an all-planar source

System and method for controlling plasma density

Non-ambipolar plasma ehncanced DC/VHF phasor

Self-sustained non-ambipolar direct current (DC) plasma at low power

Microwave plasma device

Microwave plasma device

PROCESSING SYSTEM FOR NON-AMBIPOLAR ELECTRON PLASMA (NEP) TREATMENT OF A SUBSTRATE WITH SHEATH POTENTIAL

NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL

Electric pressure systems for control of plasma properties and uniformity

Scalable and uniformity controllable diffusion plasma source

DC PULSE ETCHER

Microwave surface-wave plasma device

Microwave surface-wave plasma device

METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING

Method of providing stable and adhesive interface between fluorine based low k material and metal barrier layer

Low profile magnetic filter

Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatus

Stable surface wave plasma source

Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatus

Plasma source pumping and gas injection baffle

Hollow cathode device and method for using the device to control the uniformity of a plasma process

Plasma tuning rods in microwave resonator plasma sources

Plasma tuning rods in microwave resonator processing systems

Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereof

Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof

Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties

Processing chamber integrated pressure control

Plasma-Tuning Rods in Surface Wave Antenna (SWA) Sources

Plasma tuning rods in microwave resonator plasma sources

Plasma tuning rods in microwave processing systems

Methods of electrical signaling in an ion energy analyzer

Ion energy analyzer and methods of manufacturing the same

Ion energy analyzer

Method and system for introducing process fluid through a chamber component

Using vacuum ultra-violet (VUV) data in microwave sources

Using vacuum ultra-violet (VUV) data in radio frequency (RF) sources

Switchable Neutral Beam Source

Apparatus and method for improving photoresist properties using a quasi-neutral beam

Method of depositing stable and adhesive interface between fluorine-based low-k material and metal barrier layer

Method of providing stable and adhesive interface between fluorine-based low-k material and metal barrier layer

DC and RF hybrid processing system

Stable surface wave plasma source

Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques

Method and system for controlling radical distribution

Apparatus and Method for Improving Photoresist Properties

Method and system for etching a MEM device

Multi-plasma neutral beam source and method of operating

Two-grid ion energy analyzer and methods of manufacturing and operating

Ion energy analyzer and methods of manufacturing and operating

Mono-energetic neutral beam activated chemical processing system and method of using

Hollow cathode device and method for using the device to control the uniformity of a plasma process

Suppressor of hollow cathode discharge in a shower head fluid distribution system

Method for plasma processing over wide pressure range

Method and system for low pressure plasma processing

Neutral beam source and method for plasma heating

Processing system for producing a negative ion plasma

Method and apparatus for creating a Spacer-Optimization (S-O) library

Method and apparatus for spacer-optimization (S-O)

Method and apparatus for creating a gate optimization evaluation library

Method and apparatus for optimizing a gate channel

Method and system for introducing process fluid through a chamber component

Dynamic temperature backside gas control for improved within-substrate process uniformity

Dynamic control of process chemistry for improved within-substrate process uniformity

Hyperthermal neutral beam source and method of operating

Method and system for uniformity control in ballistic electron beam enhanced plasma processing system

Radial line slot antenna having a conductive layer

Electron beam enhanced surface wave plasma source

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current

Method and system for controlling the uniformity of a ballistic electron beam by RF modulation

Hyperthermal neutral beam source and method of operating

Method and system for controlling radical distribution

Surface wave plasma processing system and method of using

Method and system for forming a feature in a high-k layer