Peter L.G. Ventzek

Plasma Processing System with Synchronized Signal Modulation

Methods for high precision plasma etching of substrates

Method for using heated substrates for process chemistry control

Integrated induction coil and microwave antenna as an all-planar source

Plasma processing apparatus and measurement method

System and method for controlling plasma density

Hollow cathode device and method for using the device to control the uniformity of a plasma process

Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties

Plasma-Tuning Rods in Surface Wave Antenna (SWA) Sources

Plasma tuning rods in microwave resonator plasma sources

Plasma tuning rods in microwave processing systems

Thin-film capacitor with a field modification layer

RLSA CVD deposition control using halogen gas for hydrogen scavenging

Hollow cathode device and method for using the device to control the uniformity of a plasma process

Method of forming semiconductor device having nanotube structures

Laterally grown nanotubes and method of formation

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Method for removing metal foot during high-k dielectric/metal gate etching

Thin-film capacitor with a field modification layer and methods for forming the same

Method and apparatus for improving nitrogen profile during plasma nitridation

Deposition and patterning of boron nitride nanotube ILD

Method for etching a quartz layer in a photoresistless semiconductor mask