Jay T. Scheuer

XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER

XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER

Systems and methods for optimizing full horizontal scanned beam distance

Mismatched optics for angular control of extracted ion beam

Device to control uniformity of extracted ion beam

Variable thickness ion source extraction plate

Particle yield via beam-line pressure control

Ion source with single-slot tubular cathode

Ion source with single-slot tubular cathode

Electrostatic filter providing reduced particle generation

In-situ plasma cleaning of process chamber components

Cylindrical shaped arc chamber for indirectly heated cathode ion source

In-situ plasma cleaning of process chamber components

RF clean system for electrostatic elements

Apparatus and method for in-situ cleaning in ion beam apparatus

Apparatus and method for contamination control in ion beam apparatus

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS HAVING VARIED GEOMETRIES

Liquid immersion doping

In-situ plasma cleaning of process chamber components

COLD IMPLANT FOR OPTIMIZED SILICIDE FORMATION

METHOD AND APPARATUS FOR PLASMA DOSE MEASUREMENT

Flexible ion source

RF electron source for ionizing gas clusters

METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA PROCESSING APPLICATIONS

Monitoring plasma ion implantation systems for fault detection and process control

Wafer platen equipped with electrostatic clamp, wafer backside gas cooling, and high voltage operation capability for plasma doping

Plasma implantation using halogenated dopant species to limit deposition of surface layers

Reduction of source and drain parasitic capacitance in CMOS devices

Plasma immersion ion implantion apparatus and method