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Inventor profile of:

Paul Corné Henri DE WIT

City:

Eindhoven

Country:

Netherlands

Published Applications:

Last publication date:

2025-01-23

Top Assignees for applications by Paul Corné Henri DE WIT

The entities that hold a legal rights for patent applications filed by inventor DE WIT Paul Corné Henri:

ASML Netherlands B.V. 12 Veldhoven, Netherlands

Recent patent applications by DE WIT Paul Corné Henri

Paul Corné Henri DE WIT from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-01-23

US20250028259A1

Physics

Imprint Apparatus with Movable Stages

#2 | 2024-12-05

US20240402620A1

Physics

SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

#3 | 2023-08-24

US20230266678A1

Physics

Lithographic apparatus

#4 | 2023-04-20

US20230121341A1

Physics

Positioning device

#5 | 2021-07-22

US20210223703A1

Physics

Lithographic apparatus

#6 | 2020-05-21

US20200159126A1

Physics

Lithographic apparatus

#7 | 2019-12-12

US20190377266A1

Physics

Lithographic apparatus

#8 | 2019-06-20

US20190187573A1

Physics

Lithographic apparatus

#9 | 2019-06-20

US20190187566A1

Physics

Lithographic apparatus

#10 | 2018-11-15

US20180329292A1

Physics

Imprint apparatus with movable stages

#11 | 2018-05-31

US20180149986A1

Physics

Lithographic apparatus, object positioning system and device manufacturing method

#12 | 2016-12-29

US20160377996A1

Physics

System for positioning an object in lithography

InventorID:

1750148 ⎘