Tokyo
Japan
15
2026-03-19
The entities that hold a legal rights for patent applications filed by inventor Dei Satoshi:
Satoshi Dei from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#2 | 2025-08-07RESIST UNDERLAYER FILM-FORMING COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#3 | 2025-04-03SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM FORMING COMPOSITION
#4 | 2024-08-29METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
#5 | 2024-08-01METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
#6 | 2024-05-02SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
#7 | 2023-08-03Method for forming protective film, method for manufacturing patterned substrate, and composition
#8 | 2023-02-09COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD OF FORMING RESIST PATTERN
#9 | 2015-12-17Inorganic film-forming composition for multilayer resist processes, and pattern-forming method
#10 | 2015-12-10COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND
#11 | 2015-02-19Method for forming pattern, and polysiloxane composition
#12 | 2013-05-23Polysiloxane composition and pattern-forming method
#13 | 2013-04-04Insulation pattern-forming method and insulation pattern-forming material
#14 | 2010-07-15INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION
#15 | 2010-07-01NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN
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