Milpitas, California
United States
56
2025-11-27
The entities that hold a legal rights for patent applications filed by inventor BANSAL Amit Kumar:
Amit Kumar BANSAL from Milpitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:
INCREASED LIFE SUBSTRATE SUPPORT ASSEMBLY
#2 | 2025-08-14HIGH DENSITY AMORPHOUS CARBON FILM WITH REDUCED HYDROGEN CONTENT
#3 | 2025-06-19BAFFLE IMPLEMENTATION FOR IMPROVING BOTTOM PURGE GAS FLOW UNIFORMITY
#4 | 2024-11-07CLEANING ASSEMBLIES FOR SUBSTRATE PROCESSING CHAMBERS
#5 | 2024-02-08Faceplate having a curved surface
#6 | 2023-11-09COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING
#7 | 2023-11-09COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING
#8 | 2023-06-22PECVD process
#9 | 2023-05-25EXTERNAL SUBSTRATE SYSTEM ROTATION IN A SEMICONDUCTOR PROCESSING SYSTEM
#10 | 2023-04-27Method and system for cleaning a process chamber
#11 | 2023-04-20Faceplate having a curved surface
#12 | 2023-02-16Isolator apparatus and methods for substrate processing chambers
#13 | 2022-12-22GROUND PATH SYSTEMS FOR PROVIDING A SHORTER AND SYMMETRICAL GROUND PATH
#14 | 2022-09-29Cleaning assemblies for substrate processing chambers
#15 | 2022-06-09SEMICONDUCTOR PROCESSING APPARATUS FOR HIGH RF POWER PROCESS
#16 | 2022-04-21High temperature face plate for deposition application
#17 | 2022-03-31SYSTEM AND METHOD OF CLEANING PROCESS CHAMBERS USING PLASMA
#18 | 2021-12-23High temperature face plate for deposition application
#19 | 2021-12-16Radio frequency ground system and method
#20 | 2021-07-15CHAMBER DESIGN FOR SEMICONDUCTOR PROCESSING
#21 | 2021-05-27UNIVERSAL ADJUSTABLE BLOCKER PLATE FOR FLOW DISTRIBUTION TUNING
#22 | 2021-04-15METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA
#23 | 2021-02-04RADIO FREQUENCY POWER RETURN PATH
#24 | 2021-01-07Isolator apparatus and methods for substrate processing chambers
#25 | 2020-12-24PECVD process
#26 | 2020-12-10Baffle implementation for improving bottom purge gas flow uniformity
#27 | 2020-12-10Faceplate having a curved surface
#28 | 2020-10-15PLASMA DENSIFICATION WITHIN A PROCESSING CHAMBER
#29 | 2020-08-20Showerhead assembly with multiple fluid delivery zones
#30 | 2020-08-06Method and system for cleaning a process chamber
#31 | 2020-07-09Pumping apparatus and method for substrate processing chambers
#32 | 2020-05-21Device and method for tuning plasma distribution using phase control
#33 | 2020-04-02Coaxial lift device with dynamic leveling
#34 | 2020-03-05Gas input system for a substrate processing chamber
#35 | 2020-02-06On stack overlay improvement for 3D NAND
#36 | 2020-02-06Gas box for CVD chamber
#37 | 2020-02-06Faceplate with embedded heater
#38 | 2020-01-30External substrate system rotation in a semiconductor processing system
#39 | 2020-01-09SEMICONDUCTOR PROCESSING APPARATUS FOR HIGH RF POWER PROCESS
#40 | 2019-12-19TECHNIQUE TO ENABLE HIGH TEMPERATURE CLEAN FOR RAPID PROCESSING OF WAFERS
#41 | 2019-11-28Ground path systems for providing a shorter and symmetrical ground path
#42 | 2019-07-04Temperature measurement in multi-zone heater
#43 | 2019-07-04Plasma corrision resistive heater for high temperature processing
#44 | 2019-05-23Shadow ring for modifying wafer edge and bevel deposition
#45 | 2019-04-25System and method for substrate processing chambers
#46 | 2019-04-04Showerhead assembly with multiple fluid delivery zones
#47 | 2019-03-14Bottom and side plasma tuning having closed loop control
#48 | 2019-03-14Method for cleaning a process chamber
#49 | 2018-09-13PECVD process
#50 | 2018-03-22Heater pedestal assembly for wide range temperature control
#51 | 2018-03-08PECVD process
#52 | 2017-10-26Dynamic wafer leveling/tilting/swiveling steps for use during a chemical vapor deposition process
#53 | 2017-06-08Wafer rotation in a semiconductor chamber
#54 | 2017-03-09Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers
#55 | 2017-03-02Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system
#56 | 2017-01-19PECVD process
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