Deurne
Netherlands
13
2024-11-21
The entities that hold a legal rights for patent applications filed by inventor DIRKS Remco:
Remco DIRKS from Deurne, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC SYSTEM
#2 | 2024-02-22MODULAR AUTOENCODER MODEL FOR MANUFACTURING PROCESS PARAMETER ESTIMATION
#3 | 2024-02-22MODULAR AUTOENCODER MODEL FOR MANUFACTURING PROCESS PARAMETER ESTIMATION
#4 | 2023-09-14MAPPING METRICS BETWEEN MANUFACTURING SYSTEMS
#5 | 2022-06-02Metrology method and apparatus, computer program and lithographic system
#6 | 2020-06-25Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
#7 | 2020-04-09Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus
#8 | 2020-02-20Method and metrology apparatus for determining estimated scattered radiation intensity
#9 | 2017-06-22Process flagging and cluster detection without requiring reconstruction
#10 | 2017-06-08Statistical hierarchical reconstruction from metrology data
#11 | 2017-01-19Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method
#12 | 2011-06-09Methods and apparatus for determining electromagnetic scattering properties and structural parameters of periodic structures
#13 | 2011-04-28Methods and apparatus for calculating electromagnetic scattering properties of a structure using a normal-vector field and for reconstruction of approximate structures
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