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Inventor profile of:

Thomas Knisley

City:

Monroe, Michigan

Country:

United States

Published Applications:

7

Last publication date:

2020-01-02

Top Assignees for applications by Thomas Knisley

The entities that hold a legal rights for patent applications filed by inventor Knisley Thomas:

  • Applied Materials, Inc. 6 Santa Clara, CA United States

Recent patent applications by Knisley Thomas

Thomas Knisley from Monroe, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-01-02
US20200006056A1
Electricity

Deposition and etch processes of chromium-containing thin films for semiconductor manufacturing

#2 | 2020-01-02
US20200002814A1
Chemistry; metallurgy

Tin-containing precursors and methods of depositing tin-containing films

#3 | 2019-02-21
US20190055650A1
Chemistry; metallurgy

Iridium precursors for ALD and CVD thin film deposition and uses thereof

#4 | 2019-01-17
US20190017171A1
Chemistry; metallurgy

Methods and apparatus for depositing yttrium-containing films

#5 | 2018-10-11
US20180291504A1
Chemistry; metallurgy

Iridium precursors for ALD and CVD thin film deposition and uses thereof

#6 | 2017-11-09
US20170323775A1
Electricity

Methods of depositing SiCON with C, O and N compositional control

#7 | 2017-01-26
US20170022609A1
Chemistry; metallurgy

Heteroleptic Diazadiene-Containing Tungsten Precursors for Thin Film Deposition

InventorID:

1779438 ⎘

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