Ulm
Germany
53
2026-05-14
The entities that hold a legal rights for patent applications filed by inventor Hauf Markus:
Markus Hauf from Ulm, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
ACTUATABLE MIRROR ASSEMBLY
#2 | 2025-06-26APPARATUS FOR STRESS-REDUCED MOUNTING OF MEMS-BASED MICROMIRRORS
#3 | 2025-06-19INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS
#4 | 2025-06-05MICRO-OPTICAL ELEMENT
#5 | 2025-02-06TEMPERATURE-INSENSITIVE ACTUATOR AND DEFORMATION MIRROR
#6 | 2025-01-23ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FACET MIRRORS
#7 | 2021-05-20Method and device for determining the heating state of an optical element in an optical system for microlithography
#8 | 2020-07-09Method for determining properties of an EUV source
#9 | 2019-10-10EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#10 | 2019-06-27Device for transmitting electrical signals, and lithography apparatus
#11 | 2019-06-27Sensor device
#12 | 2018-10-18EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#13 | 2017-12-21Device for swiveling a mirror element with two degrees of swiveling freedom
#14 | 2017-11-16Arrangement for manipulating the position of an element
#15 | 2017-11-02EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#16 | 2017-09-28Mirror device
#17 | 2017-09-14Arrangement for actuating at least one optical element in an optical system
#18 | 2016-11-24Mirror array
#19 | 2016-11-24Method for illuminating an object field of a projection exposure system
#20 | 2016-09-08Support apparatus for an optical device, optical device and lithography system
#21 | 2016-07-07EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#22 | 2016-02-18Device for controlling temperature of an optical element
#23 | 2016-02-11Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus
#24 | 2016-01-28Model-based control of an optical imaging device
#25 | 2015-11-05Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations
#26 | 2015-10-29Arrangement for the actuation of at least one element in an optical system
#27 | 2015-08-13Multi facet mirror of a microlithographic projection exposure apparatus
#28 | 2015-07-16Arrangement for actuating at least one optical element in an optical system
#29 | 2015-04-09Device for controlling temperature of an optical element
#30 | 2014-11-27Lithography device with eddy-current brake
#31 | 2014-08-07Support structure and related assemblies and methods
#32 | 2014-07-31Optical module for guiding a radiation beam
#33 | 2014-07-24Damping arrangement for dissipating oscillating energy of an element in a system, more particularly in a microlithographic projection exposure apparatus
#34 | 2014-04-10Device for controlling temperature of an optical element
#35 | 2014-01-16Arrangement for actuating an element in a projection exposure apparatus
#36 | 2013-10-10EUV lithography system
#37 | 2013-07-11Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
#38 | 2013-06-06EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#39 | 2013-05-23Multi facet mirror of a microlithographic projection exposure apparatus with a tilting actuator
#40 | 2013-04-11Device for controlling temperature of an optical element
#41 | 2012-02-23OPTICAL MODULE FOR GUIDING A RADIATION BEAM
#42 | 2012-02-02Device for controlling temperature of an optical element
#43 | 2011-11-17Support structure and related assemblies and methods
#44 | 2011-11-10Lithographic apparatus and thermal optical manipulator control method
#45 | 2011-04-07Optical element and method
#46 | 2011-03-17Illumination optics for EUV microlithography and related system and apparatus
#47 | 2011-01-20Projection illumination system for EUV microlithography
#48 | 2010-08-12Optical correction device
#49 | 2010-08-12Device for controlling temperature of an optical element
#50 | 2009-10-15Optical element and method
#51 | 2009-07-09Optical apparatus and method for modifying the imaging behavior of such apparatus
#52 | 2009-02-19Lithographic apparatus and thermal optical manipulator control method
#53 | 2008-12-25Optical assembly, projection exposure apparatus and projection objective
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