Douglas C. Watson

LIQUID JET AND RECOVERY SYSTEM FOR IMMERSION LITHOGRAPHY

ENVIRONMENTAL SYSTEM INCLUDING A TRANSPORT REGION FOR AN IMMERSION LITHOGRAPHY APPARATUS

Liquid jet and recovery system for immersion lithography

Environmental system including a transport region for an immersion lithography apparatus

Liquid jet and recovery system for immersion lithography

Environmental system including a transport region for an immersion lithography apparatus

Liquid jet and recovery system for immersion lithography

INTERMITTENT TEMPERATURE CONTROL OF MOVABLE OPTICAL ELEMENTS

Orientation independent focus mechanisms for laser radar

Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer

Mirror assembly for an exposure apparatus

High heat load optics with vibration isolated hoses in an extreme ultraviolet lithography system

Vacuum chamber assembly for supporting a workpiece

Reaction assembly for a stage assembly

Multiple-blade holding devices

SYSTEM AND METHOD FOR CONTROLLING THE DISTORTION OF A RETICLE

Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs)

Liquid jet and recovery system for immersion lithography

Environmental system including a transport region for an immersion lithography apparatus

Temperature-controlled holding devices for planar articles

Liquid jet and recovery system for immersion lithography

INTERMEDIATE VACUUM SEAL ASSEMBLY FOR SEALING A CHAMBER HOUSING TO A WORKPIECE

Control systems and methods for compensating for effects of a stage motor

RETICLE ERROR REDUCTION BY COOLING

SHIELD LAYER PLUS REFRIGERATED BACKSIDE COOLING FOR PLANAR MOTORS

Fluid pressure compensation for immersion litography lens

Exposure method and device manufacturing method including selective deformation of a mask

High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations

System for isolating an exposure apparatus

EXPOSURE APPARATUS WITH A SCANNING ILLUMINATION BEAM

Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object

Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port

Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid

Temperature-regulating devices for reflective optical elements

Self-correcting optical elements for high-thermal-load optical systems

Reflective optical elements exhibiting multimetallic-like self-correction of distortions caused by heating

Liquid jet and recovery system for immersion lithography

DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES

Lithography apparatus with flexibly supported optical system

EUV reticle handling system and method

Fluid pressure compensation for immersion lithography lens

CI-core actuator for long travel in a transverse direction

Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus

Linear motor driven automatic reticle blind

Conforming seats for clamps used in mounting an optical element, and optical systems comprising same

Damper for a stage assembly

Device container assembly with adjustable retainers for a reticle

Cleanup method for optics in immersion lithography using bubbles

Environmental system including a transport region for an immersion lithography apparatus

Liquid jet and recovery system for immersion lithography

Iron core motor driven automatic reticle blind

Stage assembly with secure device holder

EUVL reticle stage and reticle protection system and method

KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES

Six Degree-of-Freedom Stage Apparatus

Environmental system including a transport region for an immersion lithography apparatus

Environmental system including a transport region for an immersion lithography apparatus

Environmental system including a transport region for an immersion lithography apparatus

Cleanup method for optics in immersion lithography

Aperture changing apparatus and method

System for controlling a dual mover assembly for an exposure apparatus

Thermophoretic Techniques for Protecting Reticles from Contaminants

Cleanup method for optics in immersion lithography

Cooled optical filters and optical systems comprising same

Lithography apparatus and method utilizing pendulum interferometer system

Environmental system including a transport region for an immersion lithography apparatus

Cleanup method for optics in immersion lithography using sonic device

Liquid cooled mirror for use in extreme ultraviolet lithography

Seal assembly for an exposure apparatus

Barrier assembly for an exposure apparatus

Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same

Lithographic optical systems including exchangeable optical-element sets

Multiple system vibration isolator

Stage assembly with lightweight fine stage and low transmissibility

EUV reticle handling system and method

Fine force actuator assembly for chemical mechanical polishing apparatuses

Cleanup method for optics in immersion lithography

Liquid jet and recovery system for immersion lithography

Environmental system including a transport region for an immersion lithography apparatus

Vibration isolator with low lateral stiffness

Fine force control of actuators for chemical mechanical polishing apparatuses

Compensating for cable drag forces in high precision stages

Multiple stage, stage assembly having independent stage bases

Kinematic optical mounting assembly with flexures

Stage assembly having a follower assembly

System and method for holding a device with minimal deformation

Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system

Holder mover for a stage assembly

Kinematic lens mount with reduced clamping force

Deformable mirror with high-bandwidth servo for rigid body control

Deformable mirror with passive and active actuators

Flexure supported wafer table