Tokyo
Japan
12
2026-05-14
The entities that hold a legal rights for patent applications filed by inventor Ueda Shinya:
Shinya Ueda from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD AND SYSTEM FOR FORMING SILICON NITRIDE ON A SIDEWALL OF A FEATURE
#2 | 2025-01-09DISPLAY SYSTEM AND CONTENT DISPLAY METHOD
#3 | 2024-07-04POSITIONING APPARATUS AND POSITIONING METHOD
#4 | 2024-06-06ADVERTISEMENT MANAGEMENT SYSTEM AND ADVERTISEMENT MANAGEMENT METHOD
#5 | 2022-10-13Position information transmission device, position information transmission method, and program
#6 | 2022-04-07METHOD AND SYSTEM FOR FORMING SILICON NITRIDE ON A SIDEWALL OF A FEATURE
#7 | 2021-05-13METHOD OF FORMING A STRUCTURE INCLUDING SILICON OXIDE
#8 | 2020-11-12Method of depositing material onto a surface and structure formed according to the method
#9 | 2020-10-08Method for forming silicon nitride film selectively on top/bottom portions
#10 | 2019-10-31Plasma enhanced atomic layer deposition (PEALD) of SiN using silicon-hydrohalide precursors
#11 | 2019-02-21Method for forming silicon nitride film selectively on top surface
#12 | 2017-08-31Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
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