Inventor profile of:

Daniel P. Spence

City:

Carlsbad, California

Country:

United States

Published Applications:

43

Last publication date:

2026-04-16

Top Assignees for applications by Daniel P. Spence

The entities that hold a legal rights for patent applications filed by inventor Spence Daniel P.:

Recent patent applications by Spence Daniel P.

Daniel P. Spence from Carlsbad, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-04-16
US20260107711A1
Electricity

PRECURSORS FOR DEPOSITING FILMS WITH ELASTIC MODULUS

#2 | 2026-01-22
US20260022136A1
Chemistry; metallurgy

Silicon Compounds And Methods For Depositing Films Using Same

#3 | 2024-07-18
US20240240309A1
Chemistry; metallurgy

New Precursors For Depositing Films With High Elastic Modulus

#4 | 2024-02-15
US20240052490A1
Chemistry; metallurgy

MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM

#5 | 2023-11-30
US20230386825A1
Electricity

ALKOXYDISILOXANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM

#6 | 2023-09-07
US20230279030A1
Chemistry; metallurgy

CYCLOSILOXANES AND FILMS MADE THEREWITH

#7 | 2023-06-01
US20230167549A1
Chemistry; metallurgy

ORGANOAMINO-POLISILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS

#8 | 2023-04-20
US20230123377A1
Chemistry; metallurgy

Silicon Compounds And Methods For Depositing Films Using Same

#9 | 2023-04-06
US20230103933A1
Electricity

NEW PRECURSORS FOR DEPOSITING FILMS WITH ELASTIC MODULUS

#10 | 2023-02-23
US20230058258A1
Chemistry; metallurgy

METHOD FOR DEPOSITING A FILM

#11 | 2022-12-08
US20220388033A1
Performing operations; transporting

PRECURSORS FOR DEPOSITING FILMS WITH HIGH ELASTIC MODULUS

#12 | 2022-09-22
US20220301862A1
Electricity

MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM

#13 | 2020-03-05
US20200075323A1
Electricity

Silacycloalkane compounds and methods for depositing silicon containing films using same

#14 | 2019-11-28
US20190359637A1
Chemistry; metallurgy

Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films

#15 | 2018-10-11
US20180294152A1
Electricity

Methods for depositing films with organoaminodisilane precursors

#16 | 2018-08-09
US20180223428A1
Chemistry; metallurgy

Organoamino-polysiloxanes for deposition of silicon-containing films

#17 | 2018-05-03
US20180122631A1
Electricity

Precursors and flowable CVD methods for making low-k films to fill surface features

#18 | 2017-06-29
US20170186605A1
Electricity

Methods for depositing films with organoaminodisilane precursors

#19 | 2016-08-18
US20160237100A1
Chemistry; metallurgy

Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films

#20 | 2016-07-14
US20160203975A1
Electricity

Methods for depositing films with organoaminodisilane precursors

#21 | 2016-03-24
US20160083847A1
Chemistry; metallurgy

Alkoxyaminosilane compounds and applications thereof

#22 | 2015-05-28
US20150147871A1
Chemistry; metallurgy

AZA-polysilane precursors and methods for depositing films comprising same

#23 | 2015-02-26
US20150056822A1
Electricity

Compositions and methods using same for flowable oxide deposition

#24 | 2014-06-12
US20140158580A1
Performing operations; transporting

Alkoxysilylamine compounds and applications thereof

#25 | 2013-12-05
US20130323435A1
Chemistry; metallurgy

Methods for depositing films with organoaminodisilane precursors

#26 | 2013-12-05
US20130319290A1
Chemistry; metallurgy

Organoaminodisilane precursors and methods for depositing films comprising same

#27 | 2013-09-19
US20130243968A1
Chemistry; metallurgy

CATALYST SYNTHESIS FOR ORGANOSILANE SOL-GEL REACTIONS

#28 | 2013-08-01
US20130196082A1
Chemistry; metallurgy

Alkoxyaminosilane compounds and applications thereof

#29 | 2013-07-18
US20130180215A1
Chemistry; metallurgy

Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process

#30 | 2013-03-28
US20130078391A1
Chemistry; metallurgy

Complexes of imidazole ligands

#31 | 2013-01-10
US20130008345A1
Chemistry; metallurgy

Metal complexes for metal-containing film deposition

#32 | 2012-08-09
US20120201958A1
Chemistry; metallurgy

Multidentate ketoimine ligands for metal complexes

#33 | 2012-05-17
US20120121806A1
Chemistry; metallurgy

Complexes of imidazole ligands

#34 | 2012-02-23
US20120045589A1
Chemistry; metallurgy

Amidate precursors for depositing metal containing films

#35 | 2011-10-20
US20110256314A1
Chemistry; metallurgy

METHODS FOR DEPOSITION OF GROUP 4 METAL CONTAINING FILMS

#36 | 2011-10-13
US20110250126A1
Chemistry; metallurgy

Group 4 metal precursors for metal-containing films

#37 | 2011-09-01
US20110212629A1
Chemistry; metallurgy

Liquid composition containing aminoether for deposition of metal-containing films

#38 | 2011-06-09
US20110135838A1
Chemistry; metallurgy

Liquid precursor for depositing group 4 metal containing films

#39 | 2011-02-17
US20110040124A1
Chemistry; metallurgy

Method for preparing metal complexes of polydentate beta-ketoiminates

#40 | 2010-06-10
US20100143607A1
Chemistry; metallurgy

Precursors for depositing group 4 metal-containing films

#41 | 2010-05-13
US20100119726A1
Chemistry; metallurgy

Group 2 Metal Precursors For Deposition Of Group 2 Metal Oxide Films

#42 | 2009-05-28
US20090136685A1
Chemistry; metallurgy

Metal complexes of tridentate BETA -ketoiminates

#43 | 2009-05-21
US20090130338A1
Chemistry; metallurgy

Group 2 metal precursors for depositing multi-component metal oxide films

InventorID:

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