VERSUM MATERIALS US, LLC

ADDITIVES TO ENHANCE THE PROPERTIES OF DIELECTRIC FILMS

#2 | 2025-05-01 ✅ Patent 12,590,374 granted on 2026-03-31

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SELECTIVE THERMAL ATOMIC LAYER ETCHING

#3 | 2025-04-10 ✅ Patent 12,503,760 granted on 2025-12-23

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HIGH-PURITY ALKYNES FOR SELECTIVE DEPOSITION

#4 | 2024-12-05 ✅ Patent 12,428,439 granted on 2025-09-30

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LANTHANIDE AND LANTHANIDE-LIKE TRANSITION METAL COMPLEXES

#5 | 2024-09-05

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High Oxide Removal Rates Shallow Trench Isolation Chemical Mechanical Planarization Compositions

#6 | 2024-08-29 ✅ Patent 12,534,579 granted on 2026-01-27

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Organoamino-Functionalized Linear and Cyclic Oligosiloxanes for Deposition of Silicon-Containing Films

#7 | 2024-08-15 ✅ Patent 12,637,616 granted on 2026-05-26

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Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor Device

#8 | 2024-06-13 ✅ Patent 12,385,137 granted on 2025-08-12

US20240191355A1

Deposition Of Vanadium-Containing Films

#9 | 2024-05-30 ✅ Patent 12,596,977 granted on 2026-04-07

US20240177093A1

SHARED DATA INDUCED PRODUCTION PROCESS IMPROVEMENT

#10 | 2024-03-28

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Etching Composition And Method For EUV Mask Protective Structure

#11 | 2024-02-15

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MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM

#12 | 2024-01-25 ✅ Patent 12,559,699 granted on 2026-02-24

US20240026246A1

Post Chemical Mechanical Planarization (CMP) Cleaning

#13 | 2024-01-11 ✅ Patent 12,518,966 granted on 2026-01-06

US20240014036A1

SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION

#14 | 2024-01-11

US20240010915A1

Etching Solution For Titanium Nitride And Molybdenum Conductive Metal Lines

#15 | 2023-11-30 ✅ Patent 12,630,568 granted on 2026-05-19

US20230382927A1

LOW HALIDE LANTHANUM PRECURSORS FOR VAPOR DEPOSITION

#16 | 2023-11-16 ✅ Patent 12,516,073 granted on 2026-01-06

US20230365601A1

ORGANOAMINO-FUNCTIONALIZED CYCLIC OLIGOSILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS

#17 | 2023-10-19 ✅ Patent 12,618,164 granted on 2026-05-05

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ELECTRODE ATTACHMENT ASSEMBLY, CELL AND METHOD OF USE

#18 | 2023-10-12 ✅ Patent 12,205,061 granted on 2025-01-21

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Shared data induced quality control for a chemical mechanical planarization process

#19 | 2023-09-14 ✅ Patent 12,565,942 granted on 2026-03-03

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Mechanical engineering

SYSTEMS HAVING HEATED VALVE MANIFOLD ASSEMBLIES, METHODS OF MANUFACTURE OF SAME

#20 | 2023-09-14 ✅ Patent 12,584,212 granted on 2026-03-24

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COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER

#21 | 2023-06-22 ✅ Patent 12,234,383 granted on 2025-02-25

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Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereof

#22 | 2023-06-15 ✅ Patent 12,577,499 granted on 2026-03-17

US20230183611A1

Post Chemical Mechanical Planarization (CMP) Cleaning

#23 | 2023-05-04 ✅ Patent 11,912,730 granted on 2024-02-27

US20230138138A1

Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

#24 | 2023-04-20 ✅ Patent 12,441,747 granted on 2025-10-14

US20230123377A1

Silicon Compounds And Methods For Depositing Films Using Same

#25 | 2023-04-06

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NEW PRECURSORS FOR DEPOSITING FILMS WITH ELASTIC MODULUS

#26 | 2023-03-30 ✅ Patent 11,976,740 granted on 2024-05-07

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Mechanical engineering

Limited volume coaxial valve block

#27 | 2023-02-23

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METHOD FOR DEPOSITING A FILM

#28 | 2023-01-19 ✅ Patent 12,091,581 granted on 2024-09-17

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High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing

#29 | 2023-01-05 ✅ Patent 12,110,436 granted on 2024-10-08

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Performing operations; transporting

Co/Cu selective wet etchant

#30 | 2022-12-08

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PRECURSORS FOR DEPOSITING FILMS WITH HIGH ELASTIC MODULUS

#31 | 2022-12-01 ✅ Patent 12,298,669 granted on 2025-05-13

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Composition comprising three alkanolamines and a hydroxylamine for removing etch residues

#32 | 2022-11-24

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With-In Die Non-Uniformities (WID-NU) In Planarization

#33 | 2022-11-17 ✅ Patent 11,929,257 granted on 2024-03-12

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Etching solution and method for aluminum nitride

#34 | 2022-11-03

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COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM

#35 | 2022-10-20 ✅ Patent 12,435,416 granted on 2025-10-07

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COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON CONTAINING FILMS

#36 | 2022-10-20 ✅ Patent 12,325,844 granted on 2025-06-10

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Photoresist Remover

#37 | 2022-10-20

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Low Dishing Copper Chemical Mechanical Planarization

#38 | 2022-10-06 ✅ Patent 12,410,202 granted on 2025-09-09

US20220315612A1

NEW GROUP V AND VI TRANSITION METAL PRECURSORS FOR THIN FILM DEPOSITION

#39 | 2022-09-22

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MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM

#40 | 2022-09-22

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Liquid Compositions For Selectively Removing Polysilicon Over P-Doped Silicon And Silicon-Germanium During Manufacture Of A Semiconductor Device

#41 | 2022-09-22 ✅ Patent 12,281,251 granted on 2025-04-22

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Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

#42 | 2022-09-15

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SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME

#43 | 2022-09-08

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FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE

#44 | 2022-08-25 ✅ Patent 12,264,258 granted on 2025-04-01

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Compositions comprising silacycloalkanes and methods using same for deposition of silicon-containing film

#45 | 2022-08-11

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COMPOSITIONS FOR REMOVING ETCH RESIDUES, METHODS OF USING AND USE THEREOF

#46 | 2022-08-04

US20220243150A1

Cleaning Composition For Semiconductor Substrates

#47 | 2022-07-28

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ORGANOSILICON PRECURSORS FOR DEPOSITION OF SILICON-CONTAINING FILMS

#48 | 2022-07-21 ✅ Patent 12,110,435 granted on 2024-10-08

US20220228062A1

Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

#49 | 2022-07-07 ✅ Patent 12,320,001 granted on 2025-06-03

US20220213597A1

Compositions and methods using same for thermal deposition silicon-containing films

#50 | 2022-06-23

US20220195245A1

Selective Chemical Mechanical Planarization Polishing

#51 | 2022-06-16 ✅ Patent 11,631,580 granted on 2023-04-18

US20220189767A1

Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials

#52 | 2022-06-09 ✅ Patent 12,480,206 granted on 2025-11-25

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Performing operations; transporting

ORGANOAMINODISILAZANES FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS

#53 | 2022-06-09 ✅ Patent 12,226,715 granted on 2025-02-18

US20220176275A1

Degassers, degassing systems and the methods of using them

#54 | 2022-05-19 ✅ Patent 11,955,341 granted on 2024-04-09

US20220157613A1

Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor device

#55 | 2022-05-19 ✅ Patent 12,505,999 granted on 2025-12-23

US20220157601A1

Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features

#56 | 2022-05-19 ✅ Patent 11,913,112 granted on 2024-02-27

US20220154331A1

Processes for depositing silicon-containing films using halidosilane compounds and compositions

#57 | 2022-05-12

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Methods For Making Silicon Containing Films That Have High Carbon Content

#58 | 2022-03-17 ✅ Patent 12,018,040 granted on 2024-06-25

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Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films

#59 | 2022-03-03 ✅ Patent 11,946,148 granted on 2024-04-02

US20220064803A1

Hafnium oxide corrosion inhibitor

#60 | 2022-02-10 ✅ Patent 12,057,310 granted on 2024-08-06

US20220044929A1

Functionalized cyclosilazanes as precursors for high growth rate silicon-containing films

#61 | 2022-02-10

US20220044928A1

SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME

#62 | 2022-02-10 ✅ Patent 11,725,111 granted on 2023-08-15

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Compositions and processes for depositing carbon-doped silicon-containing films

#63 | 2022-02-03 ✅ Patent 11,742,200 granted on 2023-08-29

US20220037151A1

Composition and methods using same for carbon doped silicon containing films

#64 | 2022-02-03

US20220037144A1

METHODS FOR MAKING SILICON AND NITROGEN CONTAINING FILMS

#65 | 2021-12-30 ✅ Patent 12,230,496 granted on 2025-02-18

US20210407793A1

Organoaminosilane precursors and methods for depositing films comprising same

#66 | 2021-12-23

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METHODS FOR MAKING SILICON AND NITROGEN CONTAINING FILMS

#67 | 2021-12-16 ✅ Patent 11,732,351 granted on 2023-08-22

US20210388489A1

Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films

#68 | 2021-12-09 ✅ Patent 12,297,115 granted on 2025-05-13

US20210380418A1

High temperature atomic layer deposition of silicon-containing film

#69 | 2021-11-25 ✅ Patent 12,421,603 granted on 2025-09-23

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COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS

#70 | 2021-11-25 ✅ Patent 11,753,420 granted on 2023-09-12

US20210363162A1

Low halide lanthanum precursors for vapor deposition

#71 | 2021-11-04 ✅ Patent 11,702,743 granted on 2023-07-18

US20210340673A1

Trisilylamine derivatives as precursors for high growth rate silicon-containing films

#72 | 2021-11-04 ✅ Patent 11,884,859 granted on 2024-01-30

US20210340445A1

Performing operations; transporting

Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topography

#73 | 2021-11-04 ✅ Patent 12,533,709 granted on 2026-01-27

US20210339280A1

SILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME

#74 | 2021-10-21 ✅ Patent 11,667,839 granted on 2023-06-06

US20210324270A1

Low oxide trench dishing chemical mechanical polishing

#75 | 2021-10-21 ✅ Patent 12,319,637 granted on 2025-06-03

US20210323907A1

High purity ethylenediamine for semiconductor applications

#76 | 2021-10-07 ✅ Patent 11,692,110 granted on 2023-07-04

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Low oxide trench dishing chemical mechanical polishing

#77 | 2021-09-30 ✅ Patent 12,516,421 granted on 2026-01-06

US20210301405A1

Barrier Chemical Mechanical Planarization Slurries For Cobalt Films

#78 | 2021-06-17 ✅ Patent 11,254,839 granted on 2022-02-22

US20210179890A1

Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing

#79 | 2021-05-13 ✅ Patent 12,454,753 granted on 2025-10-28

US20210140040A1

COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM

#80 | 2021-04-22 ✅ Patent 11,670,512 granted on 2023-06-06

US20210118684A1

Selective deposition on silicon containing surfaces

#81 | 2021-02-11

US20210043446A1

Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features

#82 | 2021-01-21 ✅ Patent 11,952,465 granted on 2024-04-09

US20210017339A1

Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films

#83 | 2021-01-21

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Organoamino-Functionalized Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films

#84 | 2021-01-07

US20210003442A1

Ultrasonic Liquid Level Sensing Systems

#85 | 2020-11-19 ✅ Patent 11,605,535 granted on 2023-03-14

US20200365401A1

Boron-containing compounds, compositions, and methods for the deposition of a boron containing films

#86 | 2020-10-08

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Organoamino Functionalized Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films

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Low Temperature Mechanical Polishing Or Planarization Slurry For Surfactant Solubility

#88 | 2020-10-01 ✅ Patent 11,584,854 granted on 2023-02-21

US20200308416A1

Compositions and methods for the deposition of silicon oxide films

#89 | 2020-09-03

US20200277514A1

Chemical Mechanical Polishing For Copper And Through Silicon Via Applications

#90 | 2020-08-27 ✅ Patent 11,851,756 granted on 2023-12-26

US20200270749A1

Methods for depositing silicon-containing films

#91 | 2020-08-27

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Shallow Trench Isolation Chemical And Mechanical Polishing Slurry

#92 | 2020-08-06 ✅ Patent 11,649,547 granted on 2023-05-16

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Deposition of carbon doped silicon oxide

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Compositions And Methods Using Same for Silicon Containing Films

#94 | 2020-07-30 ✅ Patent 10,914,521 granted on 2021-02-09

US20200240709A1

Mechanical engineering

System and method for drying and analytical testing of containers

#95 | 2020-07-30 ✅ Patent 11,608,451 granted on 2023-03-21

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Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates

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