Pramod Subramonium

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS

Depositing a carbon hardmask by high power pulsed low frequency RF

PECVD apparatus for in-situ deposition of film stacks

Plasma activated conformal dielectric film deposition

Methods for formation of low-k aluminum-containing etch stop films

Methods of depositing smooth and conformal ashable hard mask films

CLEANING OF CARBON-BASED CONTAMINANTS IN METAL INTERCONNECTS FOR INTERCONNECT CAPPING APPLICATIONS

Methods and apparatus for selective deposition of cobalt in semiconductor processing

Plasma activated conformal dielectric film deposition

High selectivity and low stress carbon hardmask by pulsed low frequency RF power

PECVD apparatus for in-situ deposition of film stacks

Method and apparatus for purging and plasma suppression in a process chamber

Plasma activated conformal dielectric film deposition

METAL AND SILICON CONTAINING CAPPING LAYERS FOR INTERCONNECTS

Methods and apparatus for plasma-based deposition

PLASMA CLEAN METHOD FOR DEPOSITION CHAMBER

Selective Capping of Metal Interconnect Lines during Air Gap Formation

Plasma clean method for deposition chamber

In-situ deposition of film stacks

Metal and silicon containing capping layers for interconnects

Conformal doping via plasma activated atomic layer deposition and conformal film deposition

Apparatus including a plasma chamber and controller including instructions for forming a boron nitride layer

INCREASING ETCH SELECTIVITY OF CARBON FILMS WITH LOWER ABSORPTION CO-EFFICIENT AND STRESS

Plasma activated conformal dielectric film deposition

Depositing conformal boron nitride film by CVD without plasma

In-situ deposition of film stacks

Interfacial capping layers for interconnects