Inventor profile of:

Ankur Agarwal

City:

Mountain View, California

Country:

United States

Published Applications:

15

Last publication date:

2020-01-09

Top Assignees for applications by Ankur Agarwal

The entities that hold a legal rights for patent applications filed by inventor Agarwal Ankur:

Recent patent applications by Agarwal Ankur

Ankur Agarwal from Mountain View, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-01-09
US20200013661A1
Electricity

Electrostatic chuck with variable pixelated magnetic field

#2 | 2019-11-14
US20190348260A1
Electricity

METHOD AND APPARATUS FOR ION ENERGY DISTRIBUTION MANIPULATION FOR PLASMA PROCESSING CHAMBERS THAT ALLOWS ION ENERGY BOOSTING THROUGH AMPLITUDE MODULATION

#3 | 2018-09-06
US20180254171A1
Electricity

Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation

#4 | 2016-07-07
US20160196953A1
Electricity

Inductively coupled plasma apparatus

#5 | 2015-06-04
US20150155193A1
Electricity

Electrostatic chuck with variable pixelated magnetic field

#6 | 2013-08-22
US20130213935A1
Chemistry; metallurgy

Synchronized radio frequency pulsing for plasma etching

#7 | 2013-05-30
US20130134129A1
Chemistry; metallurgy

INDUCTIVELY COUPLED PLASMA APPARATUS

#8 | 2013-05-02
US20130105443A1
Electricity

Synchronous embedded radio frequency pulsing for plasma etching

#9 | 2013-05-02
US20130105085A1
Electricity

PLASMA REACTOR WITH CHAMBER WALL TEMPERATURE CONTROL

#10 | 2013-04-25
US20130098555A1
Electricity

ELECTRON BEAM PLASMA SOURCE WITH PROFILED CONDUCTIVE FINS FOR UNIFORM PLASMA GENERATION

#11 | 2012-11-01
US20120273341A1
Electricity

Methods and apparatus for controlling plasma in a process chamber

#12 | 2011-11-03
US20110265887A1
Electricity

Apparatus for radial delivery of gas to a chamber and methods of use thereof

#13 | 2011-04-28
US20110097901A1
Electricity

DUAL MODE INDUCTIVELY COUPLED PLASMA REACTOR WITH ADJUSTABLE PHASE COIL ASSEMBLY

#14 | 2011-04-28
US20110094994A1
Electricity

INDUCTIVELY COUPLED PLASMA APPARATUS

#15 | 2011-02-10
US20110031216A1
Chemistry; metallurgy

Synchronized radio frequency pulsing for plasma etching

InventorID:

203734 ⎘