Lexington, Massachusetts
United States
22
2025-02-06
The entities that hold a legal rights for patent applications filed by inventor Eisner Edward C.:
Edward C. Eisner from Lexington, US has applied for patents for these inventions. The list has both pending applications and granted patents:
MAGNETIC FOCUSING DEVICE LOW ENERGY ION BEAMS
#2 | 2018-07-31Ion implantation system having beam angle control in drift and deceleration modes
#3 | 2016-06-30Beam profiling speed enhancement for scanned beam implanters
#4 | 2016-06-30SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WITH BEAM DECELARATION
#5 | 2016-06-30Combined multipole magnet and dipole scanning magnet
#6 | 2016-06-30Combined electrostatic lens system for ion implantation
#7 | 2013-07-18Beam line design to reduce energy contamination
#8 | 2013-06-13System and method for ion implantation with improved productivity and uniformity
#9 | 2013-04-25Method and apparatus for improved uniformity control with dynamic beam shaping
#10 | 2012-10-04Uniformity of a scanned ion beam
#11 | 2012-10-04Method and apparatus for improved uniformity control with dynamic beam shaping
#12 | 2011-11-10Throughput Enhancement for Scanned Beam Ion Implanters
#13 | 2010-06-24Ion implantation with diminished scanning field effects
#14 | 2009-12-31System and method of controlling broad beam uniformity
#15 | 2008-04-03Methods for beam current modulation by ion source parameter modulation
#16 | 2008-04-03Methods for rapidly switching off an ion beam
#17 | 2008-03-20Ion beam scanning control methods and systems for ion implantation uniformity
#18 | 2008-03-20System for magnetic scanning and correction of an ion beam
#19 | 2008-03-13Systems and methods for beam angle adjustment in ion implanters
#20 | 2008-02-14Throughput enhancement for scanned beam ion implanters
#21 | 2007-06-07Ion implanter with ionization chamber electrode design
#22 | 2007-06-05Systems and methods for beam angle adjustment in ion implanters
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