Axcelis Technologies Inc.

DUAL FORCE LIFT AND GROUND PINS FOR ELECTROSTATIC CHUCK AND METHOD FOR USE THEREOF

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GRANULAR SPUTTER SOURCE TARGET WITH REPELLER CUP AND METHOD FOR USE THEREOF

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HIGH TEMPERATURE ION SOURCE

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TWIST AND TILT VERIFICATION USING DIFFRACTION PATTERNS

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HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT

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WIRE OR ROD SHAPED EXTRACTION ELECTRODE OPTICS

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METHOD FOR SETTING GAP BETWEEN CATHODE AND FILAMENT

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ION IMPLANTATION SYSTEM AND METHOD FOR IMPLANTING ALUMINUM USING NON-FLUORINE-CONTAINING HALIDE SPECIES OR MOLECULES

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Dual source injector with switchable analyzing magnet

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Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam

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Hydraulic feed system for an ion source

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Dual source injector with switchable analyzing magnet

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Hydraulic feed system for an ion source

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HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED LOW SPUTTER YIELD ION BEAM

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SHIELDED GAS INLET FOR AN ION SOURCE

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Extended lifetime dual indirectly-heated cathode ion source

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Blended energy ion implantation

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Ion source with multiple bias electrodes

#19 | 2022-10-06 ✅ Patent 11,521,821 granted on 2022-12-06

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Ion source repeller

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Hybrid high-temperature electrostatic clamp for improved workpiece temperature uniformity

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Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam

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Etching aluminum nitride or aluminum oxide to generate an aluminum ion beam

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Stepped indirectly heated cathode with improved shielding

#24 | 2021-08-12 ✅ Patent 11,923,169 granted on 2024-03-05

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Apparatus and method for metal contamination control in an ion implantation system using charge stripping mechanism

#25 | 2021-03-25 ✅ Patent 11,276,543 granted on 2022-03-15

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Hydrogen generator for an ion implanter

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Toxic outgas control post process

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System and method for extending a lifetime of an ion source for molecular carbon implants

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High power wafer cooling

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Multiple arc chamber source

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Liquid metal ion source

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Method of mixing upstream and downstream current measurements for inference of the beam current at the bend of an optical element for realtime dose control

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Reduction of condensed gases on chamber walls via heated chamber housing for semiconductor processing equipment

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Wafer soak temperature readback and control via thermocouple embedded end effector for semiconductor processing equipment

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Method for decreasing cool down time with heated system for semiconductor manufacturing equipment

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Scan and corrector magnet designs for high throughput scanned beam ion implanter

#36 | 2020-06-18 ✅ Patent 10,714,296 granted on 2020-07-14

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Ion source with tailored extraction shape

#37 | 2020-03-05 ✅ Patent 10,720,354 granted on 2020-07-21

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System and method for aligning light-transmitting birefringent workpieces

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Substrate support having customizable and replaceable features for enhanced backside contamination performance

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Scanning magnet design with enhanced efficiency

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Tetrode extraction apparatus for ion source

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Scan and corrector magnet designs for high throughput scanned beam ion implanter

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System and method of arc detection using dynamic threshold

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Hydrogen bleed gas for an ion source housing

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In-situ wafer temperature measurement and control

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Two-axis variable width mass resolving aperture with fast acting shutter motion

#46 | 2019-07-25 ✅ Patent 10,847,339 granted on 2020-11-24

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Hydrogen generator for an ion implanter

#47 | 2019-06-06 ✅ Patent 10,692,749 granted on 2020-06-23

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Method to provide consistent electrostatic clamping through real time control of electrostatic charge deposition in an electrostatic chuck

#48 | 2019-05-16 ✅ Patent 10,689,752 granted on 2020-06-23

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Film stabilization through novel materials modification of beamline components

#49 | 2019-04-25 ✅ Patent 10,794,694 granted on 2020-10-06

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Shallow angle, multi-wavelength, multi-receiver, adjustable sensitivity aligner sensor for semiconductor manufacturing equipment

#50 | 2019-04-11 ✅ Patent 10,580,616 granted on 2020-03-03

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System and method for in-situ beamline film stabilization or removal in the AEF region

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RF resonator for ion beam acceleration

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Outgassing impact on process chamber reduction via chamber pump and purge

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Lanthanated tungsten ion source and beamline components

#54 | 2018-12-06 ✅ Patent 10,679,818 granted on 2020-06-09

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Low conductance self-shielding insulator for ion implantation systems

#55 | 2018-12-06 ✅ Patent 10,676,370 granted on 2020-06-09

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Hydrogen co-gas when using aluminum iodide as an ion source material

#56 | 2018-11-13 ✅ Patent 10,128,084 granted on 2018-11-13

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Wafer temperature control with consideration to beam power input

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Wafer cooling system and method

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Ion implantation system having beam angle control in drift and deceleration modes

#59 | 2018-07-19 ✅ Patent 10,861,731 granted on 2020-12-08

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Radiant heating presoak

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System for semiconductor wafer retention and sensing in a vacuum load lock

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Phosphine co-gas for carbon implants

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Phosphorous trifluoride co-gas for carbon implants

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Low conductance self-shielding insulator for ion implantation systems

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Two-axis variable width mass resolving aperture with fast acting shutter motion

#65 | 2018-04-05 ✅ Patent 10,170,286 granted on 2019-01-01

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In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source

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Integrated emissivity sensor alignment characterization

#67 | 2018-03-08 ✅ Patent 10,395,889 granted on 2019-08-27

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In situ beam current monitoring and control in scanned ion implantation systems

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Multiple diameter in-vacuum wafer handling

#69 | 2017-12-21 ✅ Patent 10,774,419 granted on 2020-09-15

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Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products

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Implantation using solid aluminum iodide (AlI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products

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Wafer cooling apparatus and method

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Ion source repeller shield comprising a labyrinth seal

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Multi-piece electrode aperture

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High throughput serial wafer handling end station

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Ion source liner having a lip for ion implantation systems

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High throughput cooled ion implantation system and method

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Cam actuated filament clamp

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Bipolar wafer charge monitor system and ion implantation system comprising same

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Method of measuring vertical beam profile in an ion implantation system having a vertical beam angle device

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Beam profiling speed enhancement for scanned beam implanters

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Combined multipole magnet and dipole scanning magnet

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Combined electrostatic lens system for ion implantation

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Wafer clamp detection based on vibration or acoustic characteristic analysis

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Integrated extraction electrode manipulator for ion source

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System and method for electrostatic clamping of workpieces

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High throughput heated ion implantation system and method

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Variable electrode pattern for versatile electrostatic clamp operation

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Constant mass flow multi-level coolant path electrostatic chuck

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Multi Fluid Cooling System for Large Temperature Range Chuck

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Method for enhancing beam utilization in a scanned beam ion implanter

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Ion implantation system and method with variable energy control

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Reduced trace metals contamination ion source for an ion implantation system

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Optical heat source with restricted wavelengths for process heating

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Method for measuring transverse beam intensity distribution

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Multi-resistivity Johnsen-Rahbek electrostatic clamp

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Workpiece carrier

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Extraction electrode assembly voltage modulation in an ion implantation system

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Charge integration based electrostatic clamp health monitor

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Implant-induced damage control in ion implantation

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