Aalen
Germany
29
2014-10-16
The entities that hold a legal rights for patent applications filed by inventor WEISS Markus:
Markus WEISS from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Lens
#2 | 2013-04-25Optical system for EUV lithography with a charged-particle source
#3 | 2011-08-25Device for damping vibrations in projection exposure apparatuses for semiconductor lithography
#4 | 2011-04-07EUV illumination system with a system for measuring fluctuations of the light source
#5 | 2010-03-18Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
#6 | 2009-04-16Faceted mirror apparatus
#7 | 2009-01-01Apparatus for the manipulation and/or adjustment of an optical element
#8 | 2008-10-23EUV illumination system with a system for measuring fluctuations of the light source
#9 | 2008-02-21Collector with fastening devices for fastening mirror shells
#10 | 2008-01-17Collector configured of mirror shells
#11 | 2007-12-13EUV-lithography apparatus having a chamber for cleaning an optical element
#12 | 2007-10-18Illumination system
#13 | 2007-09-06FACETED MIRROR APPARATUS
#14 | 2007-07-24Illumination system with a grating element
#15 | 2007-06-28Lithographic apparatus, system and device manufacturing method
#16 | 2007-05-24Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
#17 | 2007-03-08Method for preventing contamination and lithographic device
#18 | 2006-12-28Collector with fastening devices for fastening mirror shells
#19 | 2006-10-03Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
#20 | 2006-08-15Collector with fastening devices for fastening mirror shells
#21 | 2006-05-11Collector having unused region for illumination systems using a wavelength ≦193 nm
#22 | 2006-03-21Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm
#23 | 2006-01-05Optical system having an optical element that can be brought into at least two positions
#24 | 2005-12-15Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination
#25 | 2005-05-26Method for the production of a facetted mirror
#26 | 2005-05-05Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
#27 | 2005-02-10Facet mirror having a number of mirror facets
#28 | 2005-02-10Facet mirror having a number of mirror facets
#29 | 2005-01-27Optical system
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