Gijsbert RISPENS

City:

Eersel

Country:

Netherlands

Published Applications:

Last publication date:

2024-04-18

Top Assignees for applications by Gijsbert RISPENS

The entities that hold a legal rights for patent applications filed by inventor RISPENS Gijsbert:

ASML Netherlands B.V. 9 Veldhoven, Netherlands

Recent patent applications by RISPENS Gijsbert

Gijsbert RISPENS from Eersel, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-04-18

US20240126181A1

Physics

PROCESS WINDOW BASED ON DEFECT PROBABILITY

#2 | 2024-01-04

US20240004283A1

Physics

MEMBRANE FOR EUV LITHOGRAPHY

#3 | 2021-11-18

US20210356874A1

Physics

Process window based on defect probability

#4 | 2021-04-15

US20210109438A1

Physics

Membrane for EUV lithography

#5 | 2021-01-21

US20210018850A1

Physics

Process window based on defect probability

#6 | 2020-05-28

US20200166845A1

Physics

Method for removing photosensitive material on a substrate

#7 | 2019-11-07

US20190339615A1

Physics

Lithographic patterning process and resists to use therein

#8 | 2019-05-02

US20190129299A1

Physics

Membrane for EUV lithography

#9 | 2018-01-04

US20180004085A1

Physics

Lithographic patterning process and resists to use therein

InventorID:

2082622 ⎘