Inventor profile of:

Roy WERKMAN

City:

Eindhoven

Country:

Netherlands

Published Applications:

32

Last publication date:

2026-04-23

Top Assignees for applications by Roy WERKMAN

The entities that hold a legal rights for patent applications filed by inventor WERKMAN Roy:

Recent patent applications by WERKMAN Roy

Roy WERKMAN from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-04-23
US20260111016A1
Physics

DETERMINING A CORRECTION TO A PROCESS

#2 | 2025-06-19
US20250199419A1
Physics

METHODS OF METROLOGY AND ASSOCIATED DEVICES

#3 | 2024-10-17
US20240345569A1
Physics

DETERMINING A CORRECTION TO A PROCESS

#4 | 2024-09-19
US20240310738A1
Physics

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMETER IN A SEMICONDUCTOR MANUFACTURING PROCESS

#5 | 2024-06-06
US20240184254A1
Physics

CAUSAL CONVOLUTION NETWORK FOR PROCESS CONTROL

#6 | 2024-02-01
US20240036479A1
Physics

METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS

#7 | 2023-12-14
US20230400778A1
Physics

METHODS AND COMPUTER PROGRAMS FOR CONFIGURATION OF A SAMPLING SCHEME GENERATION MODEL

#8 | 2023-10-19
US20230333485A1
Physics

TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS

#9 | 2023-06-01
US20230168594A1
Physics

Method of wafer alignment using at resolution metrology on product features

#10 | 2022-12-29
US20220413391A1
Physics

METHOD AND APPARATUS FOR DETERMINING CONTROL DATA FOR A LITHOGRAPHIC APPARATUS

#11 | 2022-10-27
US20220342319A1
Physics

METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT

#12 | 2022-09-15
US20220291593A1
Physics

METHOD AND APPARATUS FOR LITHOGRAPHIC PROCESS PERFORMANCE DETERMINATION

#13 | 2022-08-18
US20220260920A1
Physics

METHOD FOR DETERMINING A SAMPLING SCHEME, A SEMICONDUCTOR SUBSTRATE MEASUREMENT APPARATUS, A LITHOGRAPHIC APPARATUS

#14 | 2022-08-11
US20220252988A1
Physics

Method for determining corrections for lithographic apparatus

#15 | 2022-07-28
US20220236647A1
Physics

Method for controlling a semiconductor manufacturing process

#16 | 2022-05-19
US20220155698A1
Physics

Method of determining a set of metrology points on a substrate, associated apparatus and computer program

#17 | 2022-03-24
US20220091514A1
Physics

METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS

#18 | 2021-12-30
US20210405544A1
Physics

METHOD FOR OBTAINING TRAINING DATA FOR TRAINING A MODEL OF A SEMICONDUCTOR MANUFACTURING PROCESS

#19 | 2021-12-16
US20210389684A1
Physics

Optimizing a sequence of processes for manufacturing of product units

#20 | 2021-10-28
US20210333785A1
Physics

Determining a correction to a process

#21 | 2021-09-02
US20210271171A1
Physics

Estimating a parameter of a substrate

#22 | 2021-06-03
US20210165399A1
Physics

Determining a correction to a process

#23 | 2021-01-07
US20210003927A1
Physics

Method for determining contribution to a fingerprint

#24 | 2020-12-24
US20200401052A1
Physics

Method for evaluating control strategies in a semiconductor manufacturing process

#25 | 2020-09-03
US20200278614A1
Physics

Method for controlling a manufacturing apparatus and associated apparatuses

#26 | 2020-07-09
US20200218170A1
Physics

Calibration method for a lithographic apparatus

#27 | 2020-01-23
US20200026200A1
Physics

Optimizing a sequence of processes for manufacturing of product units

#28 | 2019-09-19
US20190285992A1
Physics

Method to change an etch parameter

#29 | 2019-09-05
US20190271919A1
Physics

Method for determining contribution to a fingerprint

#30 | 2019-01-10
US20190011842A1
Physics

Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer program

#31 | 2018-06-21
US20180173118A1
Physics

Calibration method for a lithographic apparatus

#32 | 2018-01-11
US20180011398A1
Physics

Method and apparatus for reticle optimization

InventorID:

2088371 ⎘