Eindhoven
Netherlands
32
2026-04-23
The entities that hold a legal rights for patent applications filed by inventor WERKMAN Roy:
Roy WERKMAN from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
DETERMINING A CORRECTION TO A PROCESS
#2 | 2025-06-19METHODS OF METROLOGY AND ASSOCIATED DEVICES
#3 | 2024-10-17DETERMINING A CORRECTION TO A PROCESS
#4 | 2024-09-19METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMETER IN A SEMICONDUCTOR MANUFACTURING PROCESS
#5 | 2024-06-06CAUSAL CONVOLUTION NETWORK FOR PROCESS CONTROL
#6 | 2024-02-01METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS
#7 | 2023-12-14METHODS AND COMPUTER PROGRAMS FOR CONFIGURATION OF A SAMPLING SCHEME GENERATION MODEL
#8 | 2023-10-19TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS
#9 | 2023-06-01Method of wafer alignment using at resolution metrology on product features
#10 | 2022-12-29METHOD AND APPARATUS FOR DETERMINING CONTROL DATA FOR A LITHOGRAPHIC APPARATUS
#11 | 2022-10-27METHOD FOR DETERMINING CONTRIBUTION TO A FINGERPRINT
#12 | 2022-09-15METHOD AND APPARATUS FOR LITHOGRAPHIC PROCESS PERFORMANCE DETERMINATION
#13 | 2022-08-18METHOD FOR DETERMINING A SAMPLING SCHEME, A SEMICONDUCTOR SUBSTRATE MEASUREMENT APPARATUS, A LITHOGRAPHIC APPARATUS
#14 | 2022-08-11Method for determining corrections for lithographic apparatus
#15 | 2022-07-28Method for controlling a semiconductor manufacturing process
#16 | 2022-05-19Method of determining a set of metrology points on a substrate, associated apparatus and computer program
#17 | 2022-03-24METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS
#18 | 2021-12-30METHOD FOR OBTAINING TRAINING DATA FOR TRAINING A MODEL OF A SEMICONDUCTOR MANUFACTURING PROCESS
#19 | 2021-12-16Optimizing a sequence of processes for manufacturing of product units
#20 | 2021-10-28Determining a correction to a process
#21 | 2021-09-02Estimating a parameter of a substrate
#22 | 2021-06-03Determining a correction to a process
#23 | 2021-01-07Method for determining contribution to a fingerprint
#24 | 2020-12-24Method for evaluating control strategies in a semiconductor manufacturing process
#25 | 2020-09-03Method for controlling a manufacturing apparatus and associated apparatuses
#26 | 2020-07-09Calibration method for a lithographic apparatus
#27 | 2020-01-23Optimizing a sequence of processes for manufacturing of product units
#28 | 2019-09-19Method to change an etch parameter
#29 | 2019-09-05Method for determining contribution to a fingerprint
#30 | 2019-01-10Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer program
#31 | 2018-06-21Calibration method for a lithographic apparatus
#32 | 2018-01-11Method and apparatus for reticle optimization
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