Fort Collins, Colorado
United States
38
2026-03-19
The entities that hold a legal rights for patent applications filed by inventor HOFFMAN DANIEL J.:
DANIEL J. HOFFMAN from Fort Collins, US has applied for patents for these inventions. The list has both pending applications and granted patents:
APPARATUS TO PRODUCE A WAVEFORM
#2 | 2025-10-09BIAS POWER SUPPLY AND BIAS POWER SUPPLY CONTROL
#3 | 2025-05-22SYSTEMS AND METHODS FOR MONITORING FAULTS, ANOMALIES, AND OTHER CHARACTERISTICS OF A SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM
#4 | 2024-02-29SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS
#5 | 2023-11-23Apparatus with switches to produce a waveform
#6 | 2023-11-23APPARATUS TO PRODUCE A WAVEFORM
#7 | 2023-11-16Apparatus to control a waveform
#8 | 2022-05-19Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
#9 | 2021-10-21SYSTEM, METHOD, AND APPARATUS FOR ION CURRENT COMPENSATION
#10 | 2020-03-19ION ENERGY BIAS CONTROL WITH PLASMA-SOURCE PULSING
#11 | 2019-06-13System, method, and apparatus for controlling ion energy distribution in plasma processing systems
#12 | 2018-01-18System, method, and apparatus for controlling ion energy distribution in plasma processing systems
#13 | 2017-12-21HDD PATTERN IMPLANT SYSTEM
#14 | 2017-09-28Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
#15 | 2016-11-24Annular baffle
#16 | 2016-09-15Plasma source device and methods
#17 | 2016-01-21ION ENERGY BIAS CONTROL APPARATUS
#18 | 2015-10-01Electrostatic remote plasma source system and method
#19 | 2015-05-28Method for controlling ion energy distribution
#20 | 2015-01-22Systems, methods, and apparatus for minimizing cross coupled wafer surface potentials
#21 | 2014-07-31Capacitively coupled remote plasma source
#22 | 2014-05-15ANNULAR BAFFLE
#23 | 2014-03-06Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
#24 | 2014-03-06Systems and methods for calibrating a switched mode ion energy distribution system
#25 | 2014-03-06Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panel
#26 | 2013-08-01SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS
#27 | 2013-01-10Physical vapor deposition chamber with capacitive tuning at wafer support
#28 | 2013-01-03Projected plasma source
#29 | 2012-12-20Method of controlling the switched mode ion energy distribution system
#30 | 2012-12-20Method of controlling the switched mode ion energy distribution system
#31 | 2012-09-27Remote plasma source generating a disc-shaped plasma
#32 | 2012-08-30System, method and apparatus for controlling ion energy distribution of a projected plasma
#33 | 2012-08-09PLASMA IMMERSION CHAMBER
#34 | 2012-07-26Electrostatic remote plasma source
#35 | 2012-06-14Methods for depositing metal in high aspect ratio features
#36 | 2012-03-01Wafer chucking system for advanced plasma ion energy processing systems
#37 | 2011-10-27System, method and apparatus for controlling ion energy distribution
#38 | 2010-09-02HDD pattern implant system
21247 ⎘