Inventor profile of:

Amit BANSAL

City:

Milpitas, California

Country:

United States

Published Applications:

17

Last publication date:

2026-01-01

Top Assignees for applications by Amit BANSAL

The entities that hold a legal rights for patent applications filed by inventor BANSAL Amit:

Recent patent applications by BANSAL Amit

Amit BANSAL from Milpitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-01-01
US20260004996A1
Electricity

UNIFORM IN SITU CLEANING AND DEPOSITION

#2 | 2025-05-01
US20250140537A1
Electricity

CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT

#3 | 2024-10-24
US20240352580A1
Chemistry; metallurgy

SIDE PUMPING CHAMBER AND DOWNSTREAM RESIDUE MANAGEMENT HARDWARE

#4 | 2024-07-25
US20240247371A1
Chemistry; metallurgy

SEMICONDUCTOR PROCESSING CHAMBERS AND METHODS FOR CLEANING THE SAME

#5 | 2023-12-14
US20230402261A1
Electricity

UNIFORM IN SITU CLEANING AND DEPOSITION

#6 | 2023-12-07
US20230392259A1
Chemistry; metallurgy

Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater

#7 | 2023-04-20
US20230120710A1
Chemistry; metallurgy

DOWNSTREAM RESIDUE MANAGEMENT HARDWARE

#8 | 2022-12-01
US20220384161A1
Electricity

Treatment for high-temperature cleans

#9 | 2022-09-29
US20220310360A1
Electricity

Uniform in situ cleaning and deposition

#10 | 2022-09-29
US20220307135A1
Chemistry; metallurgy

Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater

#11 | 2022-06-02
US20220170151A1
Chemistry; metallurgy

Actively cooled foreline trap to reduce throttle valve drift

#12 | 2022-04-21
US20220122851A1
Electricity

Gas mixer to enable RPS purging

#13 | 2022-04-21
US20220122822A1
Electricity

Cover wafer for semiconductor processing chamber

#14 | 2021-06-03
US20210166942A1
Electricity

Chamber deposition and etch process

#15 | 2021-02-04
US20210032747A1
Chemistry; metallurgy

Semiconductor processing chambers and methods for cleaning the same

#16 | 2018-03-15
US20180073142A9
Chemistry; metallurgy

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

#17 | 2016-05-26
US20160145742A1
Chemistry; metallurgy

Tunable ground planes in plasma chambers

InventorID:

2139974 ⎘