Austin, Texas
United States
99
2026-03-12
The entities that hold a legal rights for patent applications filed by inventor Ranjan Alok:
Alok Ranjan from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
APPARATUS FOR EDGE CONTROL DURING PLASMA PROCESSING
#2 | 2026-01-15PLASMA PROCESSING APPARATUS WITH TUNABLE ELECTRICAL CHARACTERISTIC
#3 | 2025-11-27PULSED CAPACITIVELY COUPLED PLASMA PROCESSES
#4 | 2025-11-06PLASMA PROCESSING METHODS USING LOW FREQUENCY BIAS PULSES
#5 | 2025-08-28METHOD OF UNIFORMITY CONTROL
#6 | 2025-05-08SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING
#7 | 2025-03-06REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
#8 | 2025-03-06Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
#9 | 2025-01-16GAS CLUSTER ASSISTED PLASMA PROCESSING
#10 | 2024-11-28Topographic selective deposition
#11 | 2024-10-17SYSTEMS FOR REAL-TIME PULSE MEASUREMENT AND PULSE TIMING ADJUSTMENT TO CONTROL PLASMA PROCESS PERFORMANCE
#12 | 2024-10-17Method and System for Plasma Processing
#13 | 2024-06-06Methods for Etching Molybdenum
#14 | 2024-02-08PLASMA PROCESSING APPARATUS
#15 | 2023-12-21Plasma processing methods using multiphase multifrequency bias pulses
#16 | 2023-11-23PLASMA ETCHING USING MULTIPHASE MULTIFREQUENCY POWER PULSES AND VARIABLE DUTY CYCLING
#17 | 2023-11-23PLASMA SYSTEMS AND PROCESSES WITH PULSED MAGNETIC FIELD
#18 | 2023-11-23Method of uniformity control
#19 | 2023-11-09Apparatus for Edge Control During Plasma Processing
#20 | 2023-11-02Autonomous operation of plasma processing tool
#21 | 2023-10-26Methods for extreme ultraviolet (EUV) resist patterning development
#22 | 2023-10-05Etching of polycrystalline semiconductors
#23 | 2023-07-20Method and Apparatus for Plasma Processing
#24 | 2023-06-15Remote source pulsing with advanced pulse control
#25 | 2023-04-20Plasma processing with radio frequency (RF) source and bias signal waveforms
#26 | 2023-03-16Pulsed Capacitively Coupled Plasma Processes
#27 | 2023-01-26Plasma processing apparatus
#28 | 2022-12-22Virtual metrology enhanced plasma process optimization method
#29 | 2022-12-08Etching metal during processing of a semiconductor structure
#30 | 2022-12-08Cyclic plasma processing
#31 | 2022-12-08Plasma Processing Apparatus with Tunable Electrical Characteristic
#32 | 2022-12-01Metal-containing liner process
#33 | 2022-11-17Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performance
#34 | 2022-11-10SACRIFICIAL GATE CAPPING LAYER FOR GATE PROTECTION
#35 | 2022-10-27Method of forming a FET structure by selective deposition of film on source/drain contact
#36 | 2022-09-29Fast neutral generation for plasma processing
#37 | 2022-08-04Contact Etch Stop Layer with Improved Etch Stop Capability
#38 | 2022-08-04Cyclic plasma etch process
#39 | 2022-06-09Defect correction on metal resists
#40 | 2022-05-24Methods for anisotropic etch of silicon-based materials with selectivity to organic materials
#41 | 2022-03-03Gas cluster assisted plasma processing
#42 | 2022-03-03Plasma processing systems and methods for chemical processing a substrate
#43 | 2022-03-01Ion angle detector
#44 | 2022-02-24Pulsed capacitively coupled plasma processes
#45 | 2022-01-27Plasma Processing Methods Using Low Frequency Bias Pulses
#46 | 2021-09-23Method for dry etching compound materials
#47 | 2021-08-12Plasma processing methods using low frequency bias pulses
#48 | 2021-07-08Methods of Plasma Processing Using a Pulsed Electron Beam
#49 | 2021-05-20Mode-switching plasma systems and methods of operating thereof
#50 | 2021-03-18Plasma processing apparatuses including multiple electron sources
#51 | 2021-02-18Three-phase pulsing systems and methods for plasma processing
#52 | 2021-01-28Mode-switching plasma systems and methods of operating thereof
#53 | 2021-01-21Method and Structure for Smoothing Substrate Patterns or Surfaces
#54 | 2021-01-21EQUIPMENT AND METHODS FOR PLASMA PROCESSING
#55 | 2021-01-14Process control enabled VDC sensor for plasma process
#56 | 2020-12-03Method for dry etching compound materials
#57 | 2020-11-19Plasma processing apparatuses having a dielectric injector
#58 | 2020-11-19Apparatuses and methods for plasma processing
#59 | 2020-08-27Method for gate stack formation and etching
#60 | 2020-08-27Method of atomic layer etching of oxide
#61 | 2020-08-27Plasma etch processes
#62 | 2020-08-27Methods and systems for focus ring thickness determinations and feedback control
#63 | 2020-08-20Method for selective etching at an interface between materials
#64 | 2020-04-30Hybrid electron beam and RF plasma system for controlled content of radicals and ions
#65 | 2020-04-30Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
#66 | 2020-04-02Methods for stability monitoring and improvements to plasma sources for plasma processing
#67 | 2020-03-05Surface modification process
#68 | 2020-03-05Apparatus and process for electron beam mediated plasma etch and deposition processes
#69 | 2020-03-05Method and apparatus for plasma processing
#70 | 2020-02-20Systems and methods of control for plasma processing
#71 | 2020-02-20Systems and methods of control for plasma processing
#72 | 2020-02-13Ruthenium hard mask process
#73 | 2020-01-02Method of isotropic etching of silicon oxide utilizing fluorocarbon chemistry
#74 | 2019-12-26Method for area-selective etching of silicon nitride layers for the manufacture of microelectronic workpieces
#75 | 2019-11-14Method of atomic layer etching of oxide
#76 | 2019-11-14Method of etching silicon nitride layers for the manufacture of microelectronic workpieces
#77 | 2019-10-17Method for ion mass separation and ion energy control in process plasmas
#78 | 2019-10-17Apparatus and Method for Controlling Ion Energy Distribution in Process Plasmas
#79 | 2019-10-03Advanced methods for plasma systems operation
#80 | 2019-08-22Method to achieve a sidewall etch
#81 | 2019-08-15Method of quasi-atomic layer etching of silicon nitride
#82 | 2019-05-09Method of conformal etching selective to other materials
#83 | 2019-03-28Plasma processing apparatus
#84 | 2019-03-14Methods of surface restoration for nitride etching
#85 | 2019-03-14Selective oxide etching method for self-aligned multiple patterning
#86 | 2019-03-14Selective nitride etching method for self-aligned multiple patterning
#87 | 2019-01-31SOLID-STATE SOURCE OF ATOMIC SPECIE FOR ETCHING
#88 | 2018-12-13Method of plasma etching of silicon-containing organic film using sulfur-based chemistry
#89 | 2018-11-08MANUFACTURING METHODS TO REDUCE SURFACE PARTICLE IMPURITIES AFTER A PLASMA PROCESS
#90 | 2018-11-01Method of cyclic plasma etching of organic film using carbon-based chemistry
#91 | 2018-11-01Method of cyclic plasma etching of organic film using sulfur-based chemistry
#92 | 2018-09-27Method of anisotropic extraction of silicon nitride mandrel for fabrication of self-aligned block structures
#93 | 2018-09-27Method of quasi-atomic layer etching of silicon nitride
#94 | 2018-09-13Method of quasi-atomic layer etching of silicon nitride
#95 | 2018-07-19Method of preferential silicon nitride etching using sulfur hexafluoride
#96 | 2018-05-17Dual-frequency surface wave plasma source
#97 | 2018-05-10Self-limiting cyclic etch method for carbon-based films
#98 | 2018-03-22Method of patterning intersecting structures
#99 | 2018-03-22Method of in situ hard mask removal
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