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Inventor profile of:

Ryan Ryoung-Han KIM

City:

Bertem

Country:

Belgium

Published Applications:

8

Last publication date:

2021-06-17

Top Assignees for applications by Ryan Ryoung-Han KIM

The entities that hold a legal rights for patent applications filed by inventor KIM Ryan Ryoung-Han:

  • IMEC VZW 5 Leuven, Belgium
  • GLOBALFOUNDRIES Inc. 3 Grand Cayman, Cayman Islands

Recent patent applications by KIM Ryan Ryoung-Han

Ryan Ryoung-Han KIM from Bertem, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2021-06-17
US20210183698A1
Electricity

Method for forming a via hole self-aligned with a metal block on a substrate

#2 | 2020-03-12
US20200083090A1
Electricity

Method for producing a gate cut structure on an array of semiconductor fins

#3 | 2019-05-23
US20190155138A1
Physics

Mask for extreme-ultraviolet (extreme-UV) lithography and method for manufacturing the same

#4 | 2018-10-25
US20180307792A1
Physics

Method for analyzing design of an integrated circuit

#5 | 2018-09-13
US20180261497A1
Electricity

Methods for forming conductive paths and vias

#6 | 2018-04-24
US15723232
Electricity

Method of making self-aligned continuity cuts in mandrel and non-mandrel metal lines

#7 | 2018-04-05
US20180096839A1
Electricity

Shrink process aware assist features

#8 | 2018-01-02
US15377125
Electricity

Method of making self-aligned continuity cuts in mandrel and non-mandrel metal lines

InventorID:

2159273 ⎘

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