Inventor profile of:

Vijayakumar C. Venugopal

City:

Berkeley, California

Country:

United States

Published Applications:

18

Last publication date:

2020-01-02

Top Assignees for applications by Vijayakumar C. Venugopal

The entities that hold a legal rights for patent applications filed by inventor Venugopal Vijayakumar C.:

Recent patent applications by Venugopal Vijayakumar C.

Vijayakumar C. Venugopal from Berkeley, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-01-02
US20200006039A1
Electricity

Methods and apparatuses for plasma chamber matching and fault identification

#2 | 2019-07-18
US20190221401A1
Electricity

Processing chamber hardware fault detection using spectral radio frequency analysis

#3 | 2018-05-17
US20180138015A1
Electricity

Processing chamber hardware fault detection using spectral radio frequency analysis

#4 | 2016-01-14
US20160013030A1
Electricity

Apparatus and method for efficient materials use during substrate processing

#5 | 2012-04-26
US20120101622A1
Electricity

Automatic fault detection and classification in a plasma processing system and methods thereof

#6 | 2010-12-30
US20100332201A1
Electricity

Methods and apparatus for predictive preventive maintenance of processing chambers

#7 | 2010-12-30
US20100332168A1
Electricity

Determining plasma processing system readiness without generating plasma

#8 | 2010-12-30
US20100332014A1
Electricity

Arrangement for identifying uncontrolled events at the process module level and methods thereof

#9 | 2010-12-30
US20100332013A1
Physics

Methods and apparatus to predict etch rate uniformity for qualification of a plasma chamber

#10 | 2010-12-30
US20100332012A1
Physics

Arrangement for identifying uncontrolled events at the process module level and methods thereof

#11 | 2010-12-30
US20100332011A1
Electricity

Methods and arrangements for in-situ process monitoring and control for plasma processing tools

#12 | 2010-12-30
US20100332010A1
Electricity

SEASONING PLASMA PROCESSING SYSTEMS

#13 | 2010-12-30
US20100330710A1
Electricity

Methods for constructing an optimal endpoint algorithm

#14 | 2009-01-01
US20090002836A1
Electricity

Collimator arrangements including multiple collimators and implementation methods thereof

#15 | 2008-07-15
US10286409
-

Method for controlling a recess etch process

#16 | 2006-03-28
US10286410
-

Method for in-situ monitoring of patterned substrate processing using reflectometry.

#17 | 2006-02-16
US20060035395A1
Physics

Process endpoint detection method using broadband reflectometry

#18 | 2005-12-27
US10401118
-

Process endpoint detection method using broadband reflectometry

InventorID:

2192926 ⎘